Patents Represented by Attorney Kubovick & Kubovick
  • Patent number: 7186386
    Abstract: A system for exhaust gas purification includes at least one adsorbent capable of adsorbing harmful substances such as hydrocarbons and the like in exhaust gas and at least one catalyst containing a catalyst component, capable of reducing said harmful substances, both provided at an in-line position of exhaust pipe of internal combustion engine. In the system, the hydrocarbons, etc. in the exhaust gas emitted during cold engine start up of internal combustion engine are adsorbed by the adsorbent and the adsorbed hydrocarbons, etc. are desorbed from the adsorbent with the temperature rise of the adsorbent caused by the heat of the exhaust gas and are burnt on the catalyst. The adsorbent contains a H type ?-zeolite having a SiO2/Al2O3 ratio of 100 or more and can maintain good adsorption capability even when exposed to an exhaust gas of 750° C. or more form an internal combustion engine.
    Type: Grant
    Filed: March 13, 2000
    Date of Patent: March 6, 2007
    Assignee: NGK Insulators, Ltd.
    Inventors: Takuya Hiramatsu, Akira Takahashi, Naomi Noda, Junichi Suzuki
  • Patent number: 7098346
    Abstract: A compound of the general formula: R1R2R4MR5, wherein R1, R2 and R4 are independently an aryl, alkyl, alkenyl or alkynyl group, wherein at least one of R1, R2 and R4 is fully or partially fluorinated, wherein M is selected from group 14 of the periodic table, and wherein R5 is either an alkoxy group, OR3, or a halogen group, X. This compound formed can be further reacted to attach an additional organic R group, and/or hydrolyzed with one or more similar compounds (preferably having one or two R groups bound to M), to form a material having a molecular weight of from 500 to 10,000, which material can be deposited on various substrates as a coating or deposited and patterned for a waveguide or other optical device components. Methods for making and using compounds of the general formula R1R2R4MR5 are also disclosed.
    Type: Grant
    Filed: December 8, 2004
    Date of Patent: August 29, 2006
    Assignee: Silecs Oy
    Inventors: Juha A. Rantala, Arto L. T. Maaninen, Tiina J. Maaninen, Jarkko J. Pietikainen
  • Patent number: 5824456
    Abstract: A composition for forming a metal oxide thin film pattern which is a solution containing one or more hydrolytic metal compounds selected from the group consisting of hydrolytic organometallic compounds (e.g., metal alkoxide) and metal halides, and a water generating agent which frees water under the effect of irradiation with active rays (e.g., o-nitrobenzyl alcohol and 2-nitroethanol) and, as required, an acid generating agent which frees acid under the effect of irradiation with active rays is disclosed. A thin film pattern is formed by coating the composition onto a substrate, irradiating active rays for forming an image on the resultant photosensitive coating film, developing the same with water or an alcoholic solvent to remove the non-exposed portion, and heat-treating the substrate to convert the remaining film into a metal oxide, thereby forming a negative-type metal oxide thin film pattern.
    Type: Grant
    Filed: January 16, 1997
    Date of Patent: October 20, 1998
    Assignee: Mitsubishi Materials Corporation
    Inventors: Katsumi Ogi, Tsutomu Atsuki, Go Sasaki, Tadashi Yonezawa, Nobuyuki Soyama