Patents Represented by Attorney Kurt Olsen
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Patent number: 6084205Abstract: Method and system for producing high quality welds in welding processes, in general, and gas tungsten arc (GTA) welding, in particular by controlling weld penetration. Light emitted from a weld pool is collected from the backside of a workpiece by optical means during welding and transmitted to a digital video camera for further processing, after the emitted light is first passed through a short wavelength pass filter to remove infrared radiation. By filtering out the infrared component of the light emitted from the backside weld pool image, the present invention provides for the accurate determination of the weld pool boundary. Data from the digital camera is fed to an imaging board which focuses on a 100.times.100 pixel portion of the image. The board performs a thresholding operation and provides this information to a digital signal processor to compute the backside weld pool dimensions and area.Type: GrantFiled: March 14, 1997Date of Patent: July 4, 2000Assignee: Sandia CorporationInventors: Donald A. Sheaffer, Ronald F. Renzi, David M. Tung, Kevin Schroder
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Patent number: 6008899Abstract: Practical third-order frequency-resolved optical grating (FROG) techniques for characterization of ultrashort optical pulses are disclosed. The techniques are particularly suited to the measurement of single and/or weak optical pulses having pulse durations in the picosecond and subpicosecond regime. The relative quantum inefficiency of third-order nonlinear optical effects is compensated for through i) use of phase-matched transient grating beam geometry to maximize interaction length, and ii) use of interface-enhanced third-harmonic generation.Type: GrantFiled: June 18, 1997Date of Patent: December 28, 1999Assignee: Sandia CorporationInventors: Rick P. Trebino, Thomas Tsang, David N. Fittinghoff, John N. Sweetser, Marco A. Krumbuegel
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Patent number: 6007963Abstract: A method of producing a patterned array of features, in particular, gate apertures, in the size range 0.4-0.05 .mu.m using projection lithography and extreme ultraviolet (EUV) radiation. A high energy laser beam is used to vaporize a target material in order to produce a plasma which in turn, produces extreme ultraviolet radiation of a characteristic wavelength of about 13 nm for lithographic applications. The radiation is transmitted by a series of reflective mirrors to a mask which bears the pattern to be printed. The demagnified focused mask pattern is, in turn, transmitted by means of appropriate optics and in a single exposure, to a substrate coated with photoresists designed to be transparent to EUV radiation and also satisfy conventional processing methods.Type: GrantFiled: June 17, 1997Date of Patent: December 28, 1999Assignee: Sandia CorporationInventors: T. E. Felter, Glenn D. Kubiak
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Patent number: 5998325Abstract: A composition suitable for safely removing hydrogen from gaseous mixtures containing hydrogen and oxygen, particularly those mixtures wherein the hydrogen concentration is within the explosive range. The composition comprises a hydrogenation catalyst, preferably Pd dispersed on carbon, wherein the concentration of Pd is from about 1-10 wt %, dispersed in a polymeric material matrix. As well as serving as a matrix to contain the hydrogenation catalyst, the polymeric material, which is substantially unreactive to hydrogen, provides both a diffusion restriction to hydrogen and oxygen, thereby limiting the rate at which the reactants (hydrogen and oxygen) can diffuse to the catalyst surface and thus, the production of heat from the recombination reaction and as a heat sink.Type: GrantFiled: September 29, 1997Date of Patent: December 7, 1999Assignee: Sandia CorporationInventor: Timothy Jon Shepodd
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Patent number: 5993969Abstract: A microporous carbon film for use as electrodes in energy strorage devices is disclosed, which is made by the process comprising the steps of: (1) heating a polymer film material consisting essentially of a copolymer of polyvinylidene chloride and polyvinyl chloride in an inert atmosphere to form a carbon film; and (2) activating said carbon film to form said microporous carbon film having a density between about 0.7 g/cm.sup.2 and 1 g/cm.sup.2 and a gravimetric capacitance of about between 120 F/g and 315 F/g.Type: GrantFiled: January 30, 1997Date of Patent: November 30, 1999Assignee: Sandia CorporationInventor: Ming X. Tan
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Patent number: 5992159Abstract: Two solutions to the problem of cooling a high temperature, high heat flux surface using controlled spray cooling are presented for use on a mandrel. In the first embodiment, spray cooling is used to provide a varying isothermal boundary layer on the side portions of a mandrel by providing that the spray can be moved axially along the mandrel. In the second embodiment, a spray of coolant is directed to the lower temperature surface of the mandrel. By taking advantage of super-Leidenfrost cooling, the temperature of the high temperature surface of the mandrel can be controlled by varying the mass flux rate of coolant droplets. The invention has particular applicability to the field of diamond synthesis using chemical vapor deposition techniques.Type: GrantFiled: September 6, 1996Date of Patent: November 30, 1999Inventors: Christopher Francis Edwards, Ellen Meeks, Robert Kee, Kevin McCarty
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Patent number: 5989776Abstract: A method of producing a patterned array of features, in particular, gate apertures, in the size range 0.4-0.05 .mu.m using projection lithography and extreme ultraviolet (EUV) radiation. A high energy laser beam is used to vaporize a target material in order to produce a plasma which in turn, produces extreme ultraviolet radiation of a characteristic wavelength of about 13 nm for lithographic applications. The radiation is transmitted by a series of reflective mirrors to a mask which bears the pattern to be printed. The demagnified focused mask pattern is, in turn, transmitted by means of appropriate optics and in a single exposure, to a substrate coated with photoresists designed to be transparent to EUV radiation and also satisfy conventional processing methods.A photoresist composition for extreme ultraviolet radiation of boron carbide polymers, hydrochlorocarbons and mixtures thereof.Type: GrantFiled: September 21, 1998Date of Patent: November 23, 1999Assignee: Sandia CorporationInventors: T. E. Felter, G. D. Kubiak
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Patent number: 5951768Abstract: A method of stabilizing a strained flame in a stagnation flow reactor. By causing a highly strained flame to be divided into a large number of equal size segments it is possible to stablize a highly strained flame that is on the verge of extinction, thereby providing for higher film growth rates. The flame stabilizer is an annular ring mounted coaxially and coplanar with the substrate upon which the film is growing and having a number of vertical pillars mounted on the top surface, thereby increasing the number of azimuthal nodes into which the flame is divided and preserving an axisymmetric structure necessary for stability.Type: GrantFiled: July 27, 1998Date of Patent: September 14, 1999Assignee: Sandia CorporationInventors: David W. Hahn, Christopher F. Edwards
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Patent number: 5953120Abstract: A compact optical probe is disclosed particularly useful for analysis of emissions in industrial environments. The instant invention provides a geometry for optically-based measurements that allows all optical components (source, detector, rely optics, etc.) to be located in proximity to one another. The geometry of the probe disclosed herein provides a means for making optical measurements in environments where it is difficult and/or expensive to gain access to the vicinity of a flow stream to be measured. Significantly, the lens geometry of the optical probe allows the analysis location within a flow stream being monitored to be moved while maintaining optical alignment of all components even when the optical probe is focused on a plurality of different analysis points within the flow stream.Type: GrantFiled: January 4, 1996Date of Patent: September 14, 1999Assignee: Sandia CorporationInventors: Kenneth Hencken, William L. Flower
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Patent number: 5947636Abstract: Disclosed are improvments to a rapid road repair vehicle comprising an improved cleaning device arrangement, two dispensing arrays for filling defects more rapidly and efficiently, an array of pre-heaters to heat the road way surface in order to help the repair material better bond to the repaired surface, a means for detecting, measuring, and computing the number, location and volume of each of the detected surface imperfection, and a computer means schema for controlling the operation of the plurality of vehicle subsystems. The improved vehicle is, therefore, better able to perform its intended function of filling surface imperfections while moving over those surfaces at near normal traffic speeds.Type: GrantFiled: December 12, 1997Date of Patent: September 7, 1999Assignee: Sandia CorporationInventor: Leo M. Mara
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Patent number: 5942093Abstract: Method and apparatus for controlling precisely the composition and delivery of liquid at sub-.mu.L/min flow rate. One embodiment of such a delivery system is an electro-osmotically driven gradient flow delivery system that generates dynamic gradient flows with sub-.mu.L/min flow rates by merging a plurality of electro-osmotic flows. These flows are delivered by a plurality of delivery arms attached to a mixing connector, where they mix and then flow into a receiving means, preferably a column. Each inlet of the plurality of delivery arms is placed in a corresponding solution reservoir. A plurality of independent programmable high-voltage power supplies is used to apply a voltage program to each of the plurality of solution reservoirs to regulate the electro-osmotic flow in each delivery arm. The electro-osmotic flow rates in the delivery arms are changed with time according to each voltage program to deliver the required gradient profile to the column.Type: GrantFiled: June 18, 1997Date of Patent: August 24, 1999Assignee: Sandia CorporationInventors: David J. Rakestraw, Deon S. Anex, Chao Yan, Rajeev Dadoo, Richard N. Zare
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Patent number: 5935639Abstract: A novel field emitter device for cold cathode field emission applications, comprising a multi-layer resistive carbon film.The multi-layered film of the present invention is comprised of at least two layers of a resistive carbon material, preferably amorphous-tetrahedrally coordinated carbon, such that the resistivities of adjacent layers differ. For electron emission from the surface, the preferred structure comprises a top layer having a lower resistivity than the bottom layer. For edge emitting structures, the preferred structure of the film comprises a plurality of carbon layers, wherein adjacent layers have different resistivities. Through selection of deposition conditions, including the energy of the depositing carbon species, the presence or absence of certain elements such as H, N, inert gases or boron, carbon layers having desired resistivities can be produced.Type: GrantFiled: January 20, 1998Date of Patent: August 10, 1999Assignee: Sandia CorporationInventors: John P. Sullivan, Thomas A. Friedmann
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Patent number: 5933706Abstract: A method for treatment of the surface of a CdZnTe (CZT) crystal that reduces surface roughness (increases surface planarity) and provides an oxide coating to reduce surface leakage currents and thereby, improve resolution. A two step process is disclosed, etching the surface of a CZT crystal with a solution of lactic acid and bromine in ethylene glycol, following the conventional bromine/methanol etch treatment, and after attachment of electrical contacts, oxidizing the CZT crystal surface.Type: GrantFiled: May 28, 1997Date of Patent: August 3, 1999Inventors: Ralph James, Arnold Burger, Kuo-Tong Chen, Henry Chang
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Patent number: 5925408Abstract: A method for treating an organic polymer material, preferably a vinylidene chloride/vinyl chloride copolymer (Saran) to produce a flat sheet of carbon film material having a high surface area (.apprxeq.1000 m.sup.2 /g) suitable as an electrode material for super capacitor applications. The method comprises heating a vinylidene chloride/vinyl chloride copolymer film disposed between two spaced apart graphite or ceramic plates to a first temperature of about 160.degree. C. for about 14 hours to form a stabilized vinylidene chloride/vinyl chloride polymer film, thereafter heating the stabilized film to a second temperature of about 750.degree. C. in an inert atmosphere for about one hour to form a carbon film; and finally activating the carbon film to increase the surface area by heating the carbon film in an oxidizing atmosphere to a temperature of at least 750-850.degree. C. for between 1-6 hours.Type: GrantFiled: April 30, 1998Date of Patent: July 20, 1999Assignee: Sandia CorporationInventor: Ming X. Tan
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Patent number: 5881594Abstract: A method of enhancing the strength of metals by affecting subsurface zones developed during the application of large sliding loads. Stresses which develop locally within the near surface zone can be many times larger than those predicted from the applied load and the friction coefficient. These stress concentrations arise from two sources: 1) asperity interactions and 2) local and momentary bonding between the two surfaces. By controlling these parameters more desirable strength characteristics can be developed in weaker metals to provide much greater strength to rival that of steel, for example.Type: GrantFiled: May 9, 1997Date of Patent: March 16, 1999Assignee: Sandia CorporationInventors: Darcy Anne Hughes, Daniel B. Dawson, John S. Korellis
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Patent number: 5870176Abstract: The present invention provides a method for maskless lithography. A plurality of individually addressable and rotatable micromirrors together comprise a two-dimensional array of micromirrors. Each micromirror in the two-dimensional array can be envisioned as an individually addressable element in the picture that comprises the circuit pattern desired. As each micromirror is addressed it rotates so as to reflect light from a light source onto a portion of the photoresist coated wafer thereby forming a pixel within the circuit pattern. By electronically addressing a two-dimensional array of these micromirrors in the proper sequence a circuit pattern that is comprised of these individual pixels can be constructed on a microchip. The reflecting surface of the micromirror is configured in such a way as to overcome coherence and diffraction effects in order to produce circuit elements having straight sides.Type: GrantFiled: June 18, 1997Date of Patent: February 9, 1999Assignee: Sandia CorporationInventors: William C. Sweatt, Richard H. Stulen
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Patent number: 5837158Abstract: A novel composition comprising organic polymer molecules having carbon-carbon double bonds, for removing hydrogen from the atmosphere within enclosed spaces.Organic polymers molecules containing carbon-carbon double bonds throughout their structures, preferably polybutadiene, polyisoprene and derivatives thereof, intimately mixed with an insoluble catalyst composition, comprising a hydrogenation catalyst and a catalyst support, preferably Pd supported on carbon, provide a hydrogen getter composition useful for removing hydrogen from enclosed spaces even in the presence of contaminants such as common atmospheric gases, water vapor, carbon dioxide, ammonia, oil mists, and water. The hydrogen getter composition disclosed herein is particularly useful for removing hydrogen from enclosed spaces containing potentially explosive mixtures of hydrogen and oxygen.Type: GrantFiled: September 23, 1996Date of Patent: November 17, 1998Assignee: Sandia CorporationInventors: Timothy Jon Shepodd, LeRoy L. Whinnery
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Patent number: 5804727Abstract: A method is described for determining and evaluating physical characteristics of a material. In particular, the present invention provides for determining and evaluating the anisotropic characteristics of materials, especially those resulting from such manufacturing processes as rolling, forming, extruding, drawing, forging, etc. In operation, a complex ultrasonic wave is created in the material of interest by any method. The wave form may be any combination of wave types and modes and is not limited to fundamental plate modes. The velocity of propagation of selected components which make up the complex ultrasonic wave are measured and evaluated to determine the physical characteristics of the material including, texture, strain/stress, grain size, crystal structure, etc.Type: GrantFiled: September 1, 1995Date of Patent: September 8, 1998Assignee: Sandia CorporationInventors: Wei-yang Lu, Shermann Min