Patents Represented by Attorney, Agent or Law Firm Kurt Ranuschenbach
  • High-density plasma source using excited atoms
    Patent number: 6806652
    Abstract: The plasma source includes a cathode assembly. An anode is positioned adjacent to the cathode assembly. An excited atom source generates an initial plasma and excited atoms from a volume of feed gas. The initial plasma and excited atoms are located proximate to the cathode assembly. A power supply generates an electric field between the cathode assembly and the anode. The electric field super-ionizes the initial plasma so as to generate a high-density plasma.
    Type: Grant
    Filed: May 12, 2003
    Date of Patent: October 19, 2004
    Assignee: Zond, Inc.
    Inventor: Roman Chistyakov