Abstract: Disclosed is a stress stable lathering skin cleansing liquid composition comprising by weight parts of the liquid composition:(a) from about 0.5 parts to 10 parts of a crystalline, hydroxyl-containing stabilizer;(b) from about 1 part to about 80 parts of lipid skin moisturizing agent;(c) from about 1 part to about 30 parts of surfactant having a combined CMC equilibrium surface tension value of from 15 to 50;(d) water.Such stress stable lathering skin cleansing liquid compositions have a Lipid Deposition Value (LDV) of from about 5 to about 100. Such compositions are also stable for at least two weeks at 100.degree. F.