Abstract: The present invention relates to methods for removing the matrix effects caused by variance in copper concentration and acidity during measurement of the organic additive concentration in a sample copper plating solution.

Abstract: A method and apparatus for abatement of effluent from a CVD process using a source reagent having a metal organic loosely bound to a organic or organomettalic molecule such that upon exposure to heat such bond is readily cleavable, e.g., copper deposition process involving the formation of films on a substrate by metalorganic chemical vapor deposition (CVD) utilizing a precursor composition for such film formation. The abatement process in specific embodiments facilitates high efficiency abatement of effluents from copper deposition processes utilizing Cu(hfac)TMVS as a copper source reagent.

Abstract: A ceramic composition having a high adsorptive capacity for oxygen at elevated temperature, including at least one of: Bi2−yEryO3−d; Bi2−yYyO3−d; La1−yBayCo1−xNixO3−d; La1−ySryCo1−xNixO3−d; La1−yCayCo1−xNixO3−d; La1−yBayCo1−xFexO3−d; La1−ySryCo1−xFexO3−d; and La1−yCayCo1−xFexO3−d; wherein x is from 0.2 to 0.8, y is from 0 to 1.0 and d=0.1 to 0.9. Such ceramic composition may be made using a modified Pechini synthetic procedure. The resulting ceramic composition is usefully employed as an adsorbent for separation of oxygen from an oxygen-containing feed gas mixture, e.g., in a pressure swing adsorption (PSA) process.