Abstract: A magnetic recording media having a CrMo underlayer provides improved performance characteristics. In one embodiment, the recording media comprises a rigid substrate and an underlayer disposed over the substrate, in which the underlayer comprises CrMo. Preferably, the Mo crystals in the CrMo underlayer are at least about 140 Å in the film growth direction for the 002 crystal plane. Advantageously, recording media with such a 002 crystal size, when used in conjunction with a magnetic layer, such as CoCrTaPtNi, exhibits significantly higher parametric qualities than underlayers using other materials. Typically, Mo in the range between about 7% and 16% in the CrMo alloy, more preferably between about 9% and 11%, will provide the recited 002 crystal size.

Abstract: The invention provides a package which varies the tension within a fiber Bragg grating (or other fiber-based optical device) by resilient deflection of a fiber support member through differential thermal expansion, thereby allowing the temperature/tension characteristics of the package to be tailored so as to provide the desired optical characteristics throughout a wide temperature range. The fiber tension/temperature correlation may be tailored using the linear coefficient of expansion of two different materials, by varying the resilient flexibility of a beam supporting the fiber, by varying a length of an arm extending from the beam to the fiber, by varying the resilient strength of the arm, and the like. By relying on the resilient deformation of a flexible fiber support structure, the present invention provides a large number of degrees of freedom within the package design parameters.

Abstract: A flexible, modular thin film deposition machine comprises a number of batch process stations which define a batch process path. At least one of the batch process stations is a thin film deposition station including a serial deposition chamber and an inter-chamber disk transfer mechanism. The disks move in batches along the process path, being individually processed only at the deposition station. Within the serial sputtering chambers of at least one deposition station there is at most partial environmental separation, whereas between different deposition stations the separation is complete. The resulting simplification of the transport mechanism provides for a high throughput rate while simultaneously minimizing contamination of individual thin film layers.