Abstract: A method of treating a gas stream containing silane or other silicon-containing gas is described, in which the gas stream is conveyed to a liquid ring pump or screw-mechanism pump, to which are also supplied an oxidant for oxidising the silicon-containing gas within the pump, and a liquid for forming a liquid ring or intermittent flushing within the pump. A liquid stream containing said liquid and a by-product of the oxidation of the silicon-containing gas is exhaust from the pump.

Abstract: An attachment (10) for an inlet pipe (14) to a wet scrubber or other device comprises a sleeve (16) having an open end (18) adapted to be detachably connected to a flanged end (12) of the inlet pipe (14). A shaft (30) is moveable within the sleeve (16), and a scraper (34) is attached to one end of the shaft (30). The shaft (30) forms part of a pneumatic cylinder (40) attached to the other end of the sleeve (16). In use, the shaft (30) is reciprocally moved to cause the scraper (34) to dislodge particulates deposited within the pipe (14). Heated gas such as nitrogen or dry air is injected into the sleeve (16) to prevent scrubbing liquid from condensing within the sleeve (16) and thus inhibit particulate deposition therein.

Abstract: A vacuum chamber used for processing articles, such as integrated circuit wafers, display panels, and the like, has a small load lock chamber formed at an opening in a wall of the chamber by a moveable article supporting surface within the chamber and a cover outside of the chamber. The supporting surface and cover are sealed to the chamber wall when urged against it. Articles placed into the load lock chamber, when the cover is opened, are moved into the vacuum chamber for processing by moving the supporting surface away from the wall after the cover has been closed and a vacuum established in the load lock chamber. Articles are removed from the vacuum chamber in a reverse manner. Various mechanisms are describe for moving the articles, including a particular robotic device that simultaneously swaps the positions of two articles between the supporting surface and a processing location within the vacuum chamber by first pulling the articles together and then rotating them in a half-circle.

Abstract: Apparatus is described for treating an effluent fluid stream from a semiconductor manufacturing process tool. The apparatus comprises a combustion chamber, means for heating the combustion chamber, and a nozzle for injecting the effluent stream into the combustion chamber. The apparatus is configured to enable a fuel and an oxidant to be selectively injected into the effluent stream as required to optimise the combustion conditions for a particular effluent stream. In one to embodiment, a lance projecting into the nozzle selectively injects an oxidant into the effluent stream, and a sleeve surrounding the nozzle selectively injects a fuel into the effluent stream.

Abstract: A method for removing fluorine gas from a selected environment comprises contacting the fluorine gas with water to generate a solution of hydrofluoric acid and contacting the solution of hydrofluoric acid with an ion exchange resin having an active state operative to exchange selected ions therein for fluoride ions in the solution. The apparatus (200) may include a dual resin setup (222, 223) such that one of the ion-exchange resin can be in the service cycle while the other of the ion-exchange resins undergoes the regeneration and rinse/refill cycles.

Abstract: The present invention provides systems and methods for facilitating communications between various components of distributed system. Specifically, the systems and methods of the present invention provide a wireless network for linking the various components of manufacturing equipment or manufacturing systems to one or more central control devices. Each component of the manufacturing equipment and the central control devices include a wireless module for handling communications between the components and the control devices. In some embodiments, one or more of the components may act as a server for other components in the network. In some embodiments, multiple data channels are used for communication between the components and the central control devices.

Abstract: The present invention provides a method for selectively removing metal ions of interest from a solution (12), such as the wastewater from a chemical mechanical polishing process. The method comprises contacting a solution (12) containing solid particles, an oxidizing agent and a first concentration of the metal ions with an ion-exchange resin (20), such as a crosslinked poly-4-vinylpyridine resin, that is resistant to damage by the oxidizing agent and that is operative when in contact with the solution (12) to exchange selected ones of the metal ions in the solution for selected preferred ions in the ion-exchange resin thereby to produce a treated solution (22) having a second concentration of the metal ions that is lower than the first concentration. The present invention also relates to an apparatus (100) and system (500) for use with the method of the present invention.