Abstract: Systems and methods are disclosed for shaping and homogenizing a laser beam for interaction with a film. The shaping and homogenizing system may include a lens array and a lens that is positioned to receive laser light from the lens array and produce a respective elongated image in a plane for each lens in the lens array. In addition, the system may include a beam stop having an edge that is positioned in the plane, and a moveable mount rotating a lens of the lens array to vary an alignment between one of the elongated images and the beam stop edge.

Abstract: Systems and methods are disclosed for focusing a beam for an interaction with a film deposited on a substrate wherein the focused beam defines a short axis and a long axis. In one aspect, the system may include a detecting system to analyze light reflected from the film on an image plane to determine whether the beam is focused in the short axis at the film. In still another aspect, a system may be provided for positioning a film (having an imperfect, non-planar surface) for interaction with a shaped line beam.

Abstract: Systems and methods are disclosed for reducing the influence of plasma generated debris on internal components of an EUV light source. In one aspect, an EUV meteorology monitor is provided which may have a heater to heat an internal multi-layer filtering mirror to a temperature sufficient to remove deposited debris from the mirror. In another aspect, a device is disclosed for removing plasma generated debris from an EUV light source collector mirror having a different debris deposition rate at different zones on the collector mirror. In a particular aspect, an EUV collector mirror system may comprise a source of hydrogen to combine with Li debris to create LiH on a collector surface; and a sputtering system to sputter LiH from the collector surface. In another aspect, an apparatus for etching debris from a surface of a EUV light source collector mirror with a controlled plasma etch rate is disclosed.

Abstract: An automatic gain control circuit in the feedback path for a laser wavelength control circuit is described herein. This gain control circuit automatically adjusts the amplification of the analog signals output from a photodetector array, where the array detects a fringe pattern created by a laser beam. Another feature of the preferred embodiment feedback circuit is the automatic setting of a DC offset voltage that compensates for errors in the feedback path and enables an accurate determination of a dark level signal in the fringe pattern signal. This dark level signal provides a reference for measuring the magnitude of the fringe pattern signal. Varying photodetector outputs may now be more accurately measured. The preferred embodiment feedback circuit also employs a very fast amplifier anti-saturation circuit using LED's connected in a clamp circuit.