Abstract: A multi-bit sigma-delta analog-to-digital converter (ADC) (40) includes a sigma-delta modulator (41) with a multi-bit quantizer (46) and a digital-to-analog converter (DAC) (47). An output of the DAC (47) provides an error signal of the modulator (41). The quantizer (46) provides a quantized signal having multiple bits ordered from a most-significant bit, to a second most significant bit, to at least one lower-order bit including a least-significant bit. At least two of these bits, including the most significant bit and one of the lower-order bit or bits, are provided as inputs to the DAC (47). The remaining bits are provided as inputs to a prefilter (49), which performs the same transfer function as a comparable multi-bit modulator. A summing device (49) subtracts the output of the prefilter (48) from the quantized signal. A decimation filter (50) resamples the output of the summing device (49) to provide the output of the ADC (40).

Abstract: A method requiring only a single mask results in an isolation oxide (50) which is the same size as, instead of becoming larger than, the dimension originally defined by the lithographic system. A buffer layer (14) is formed over the substrate (12). An oxidation resistant layer (16) is formed over the buffer layer (14). The oxidation resistant layer (16) is etched and a disposable sidewall spacer (30) is formed adjacent to the sidewall of the oxidation resistant layer (28), and a trench region is defined (36). The trench region (36) is etched to form a trench. The disposable sidewall spacer (30) is removed and a conformal layer (48) of oxidizable material is deposited over the trench sidewall (40) and the trench bottom surface (38). The conformal layer (48) is then oxidized to form electrical isolation in the isolation regions (26) of the substrate (12).