Abstract: A method for the purification of chlorosilanes used for the manufacture of electronic-grade silicon and more particularly to a method for removing trace contaminants of phosphorus. The method comprises contacting a mixture comprising a chlorosilane and a phosphorus contaminant with an absorbent comprising a copper or compound of copper supported on silica.
Abstract: A method for stabilizing a mixture comprising a polydiorganosiloxane and an alkali metal. The method comprises contacting a polydiorganosiloxane and an alkali metal with a siloxy phosphonate described by formula ##STR1## where each R.sup.1, R.sup.2, and R.sup.3 is an independently selected hydrocarbon comprising one to about 12 carbon atoms, n=0 or 1, and x, y, and z are integers, where x=1 to 1000, y=0 to 1000, and z=0 to 1000.
Abstract: This invention relates to a process for the manufacture of a silane or polyorganosiloxane containing a cycloalkyl substituent by hydrogenation of a silane or polyorganosiloxane containing at least one aromatic hydrocarbon substituent in the presence of a Raney nickel catalyst without a solvent.