Patents Represented by Attorney Melvin P. Sharp
  • Patent number: 4866421
    Abstract: An adapter circuit for a local area network is disclosed, which contains logic external to the protocol handler for address comparison. The adapter uses random-access memory to store the data fields arriving after the address fields in the serial input data stream during such time as the adapter is comparing the address fields to its own address. The portion of memory used for the data storage is overwritten (recovered) by the next frame of data if the particular adapter was not addressed by the prior frame; the portion of memory used for the data storage is not overwritten if the data was addressed to the adaptor. The protocol handler circuit performs an address comparison internally thereto, for intra-ring communication, and controls the recovery of the memory dependent upon the results of the comparison. The external logic performs an address comparison, primarily in inter-ring communication.
    Type: Grant
    Filed: June 18, 1987
    Date of Patent: September 12, 1989
    Assignee: Texas Instruments Incorporated
    Inventor: Andre Szczepanek
  • Patent number: 4861419
    Abstract: Operations of a plasma etch reactor (10) are monitored to detect aberrations in etching operations. A reference end point trace is defined (62) for the etch process. Regions are defined in the reference end point trace (70) with aid of a dynamic time warping matching function (84) and characteristics and tolerances for each region are defined (72-80). The etcher is run and an actual end point trace is obtained (82) from the running of the etcher. A warping function is constructed (88) between the actual trace and the reference trace. In building the warping function, candidate path segments (100) are constructed according to a minimum cumulative cost function (96). Once the regions of the reference trace and the actual trace has been matched according to an optimum dynamic time warping function path (106), characteristics of the matched regions are compared (66) to determine whether aberrations have occurred during the etch process.
    Type: Grant
    Filed: August 15, 1988
    Date of Patent: August 29, 1989
    Assignee: Texas Instruments Incorporated
    Inventors: Bruce E. Flinchbaugh, Steven B. Dolins, Aditya Srivastava, Jon Reese