Abstract: A system, method, and apparatus for supplying a gas-liquid vapor to a process tank for performing semiconductor manufacturing. In one aspect, the invention is a method of supplying a gas-liquid vapor to a process tank comprising: supplying a gas stream through at least one hydrophobic tube; exposing the outside surface of the hydrophobic tube to a liquid so that a vapor of the liquid permeates the hydrophobic tube and enters the gas stream, forming a gas-liquid vapor inside the tube; and transporting the gas-liquid vapor to the process tank. In another aspect, the invention is an apparatus for supplying a gas-liquid vapor to a process tank comprising: at least one hydrophobic tube adapted to carry a gas; and a housing forming a chamber that surrounds the tube, the chamber adapted to receive a liquid that can permeate the tube, forming a gas-liquid vapor.

Abstract: An apparatus and method for drying substrates. The inventive apparatus comprises: an object support member for supporting at least one substrate in a process tank having one or more support sections comprising capillary material. The inventive method is a method of removing liquid from a wet substrate in a process tank comprising contacting the wet substrate with capillary material. In another aspect, the invention is a method of drying at least one substrate having a surface in a process tank comprising: submerging the substrate in a liquid having a liquid level; supporting the submerged substrates in the process tank; supplying a drying vapor above the liquid level; lowering the liquid level or raising the substrate so that the liquid level is below the substrate, thereby removing a major portion of liquid from the substrate surface; and removing remaining liquid from the substrate surface with capillary material.

Abstract: An apparatus, transfer cask, system, and method for defueling a nuclear reactor and transferring spent nuclear fuel from a spent nuclear fuel to a storage cask for long terms storage. In one aspect, the invention is an apparatus for use in transferring a canister of spent nuclear fuel from a transfer cask to a storage cask, the apparatus comprising a radiation absorbing shield surrounding a portion of a hole through which the canister can pass; means for securing the apparatus to the top surface of the storage cask; means for securing the bottom surface of the transfer cask to the apparatus; wherein the transfer cask securing means and the storage cask securing means are positioned on the apparatus so that when the apparatus is secured to both the transfer cask and the storage cask, the cavity of the transfer cask, the hole, and the cavity of the storage cask are substantially aligned; and means for moving the bottom lid in a horizontal direction once the bottom lid is unfastened from the bottom surface.

Abstract: An apparatus and method for stabilizing a spent nuclear fuel containment cask so as to prevent tipping under design basis earthquake conditions. In one aspect, the apparatus comprises a lamina and a slid plate in surface contact with the lamina, forming a slidable interface; wherein the slidable interface has a coefficient of friction within a range resulting in an acceptable level of net horizontal displacement of a cask resting on the apparatus under design basis earthquake conditions.

Abstract: A process for removing photoresist from semiconductor wafers is disclosed wherein at least one semiconductor wafer having at least one layer of photoresist is positioned in a process tank; ozone gas is provided to said process tank; and said semiconductor wafer is spayed with a mixture of ozone and deionized water via at least one nozzle. The temperature during the process is maintained at or above ambient temperature. The ozone gas supplied to the tank is preferably under pressure within said process tank and the nozzles preferably spray the mixture of deionized water and ozone at a nozzle pressure between 5 and 10 atmospheres. In another embodiment, the invention is an apparatus for carrying out the process.

Abstract: A system and method for reducing the amount of contaminants that come into contact with wafer substrates during the production of integrated circuit devices. The system allows for uniform overflow of processing liquid from a process tank while preventing contaminants from reentering the process tank and contacting the wafers. The system in one aspect comprises an inner weir with a top surface, and overflow wall with at least one recess having a bottom, and a structure, the structure connecting the overflow wall and the inner weir to form a drainage basin with at least one drain hole; wherein the top surface of the inner weir is below the bottom of the at least one recess.

Abstract: An apparatus, system, and method of storing and transferring a canister of spent nuclear fuel. In one aspect, the apparatus is a lid for a ventilated vertical overpack having a chamber for receiving spent nuclear fuel, the lid having ventilation ducts. In one aspect, the system comprises: a lid for a ventilated vertical overpack having a chamber for receiving spent nuclear fuel, the lid having ventilation ducts; and a ventilated vertical overpack having a cylindrical body including lower ventilation ducts, a bottom, and a chamber formed by the body and the bottom adapted for receiving a canister of spent nuclear fuel.

Abstract: The present invention is for a new class of allyl urethane resin which can be cured with peroxide at high temperature alone or in combination with some accelerators. These allyl urethane resins can be sued alone or in combination with other free radically polymerizable materials such as allyl monomers and ligomers or (meth)acrylate monomers and oligomers. These new allyl urethane resins contain at least two allyl functional groups.