Patents Represented by Attorney Michael B. Fein
  • Patent number: 6848223
    Abstract: An apparatus and method for stabilizing a spent nuclear fuel containment cask so as to prevent tipping under design basis earthquake conditions. In one aspect, the apparatus comprises a lamina and a slid plate in surface contact with the lamina, forming a slidable interface; wherein the slidable interface has a coefficient of friction within a range resulting in an acceptable level of net horizontal displacement of a cask resting on the apparatus under design basis earthquake conditions.
    Type: Grant
    Filed: January 30, 2002
    Date of Patent: February 1, 2005
    Assignee: Holtec International Inc.
    Inventors: Krishna P. Singh, A J. Soler
  • Patent number: 6830657
    Abstract: The invention concerns a method for obtaining an aqueous dispersion of hydrophobic polymers dispersed in the form of particles with mean diameter less than 100 nm stablized soley with a macromolecular surfactant based on low molecular weight styrene/maleic anhydride imide copolymer. The invention also concerns the use of said dispersion for treating and sizing paper.
    Type: Grant
    Filed: March 1, 2002
    Date of Patent: December 14, 2004
    Assignee: Atofina
    Inventors: Isabelle Betremieux, Christophe Dumousseaux, Bruno Feret, Jean-Jacques Flat
  • Patent number: 6818563
    Abstract: A process for removing photoresist from semiconductor wafers is disclosed wherein at least one semiconductor wafer having at least one layer of photoresist is positioned in a process tank; ozone gas is provided to said process tank; and said semiconductor wafer is spayed with a mixture of ozone and deionized water via at least one nozzle. The temperature during the process is maintained at or above ambient temperature. The ozone gas supplied to the tank is preferably under pressure within said process tank and the nozzles preferably spray the mixture of deionized water and ozone at a nozzle pressure between 5 and 10 atmospheres. In another embodiment, the invention is an apparatus for carrying out the process.
    Type: Grant
    Filed: February 13, 2003
    Date of Patent: November 16, 2004
    Assignee: Akrion LLC
    Inventors: Richard Novak, Ismail Kashkoush, Gim-Syang Chen, Dennis Nemeth
  • Patent number: 6797877
    Abstract: A labor saving system, method, and apparatus for connecting or coupling lengths of electric metallic tubing (“EMT”). The invention uses couplings/connectors that have barbs that are designed to engage corresponding indentations on EMT to ensure proper installation. In one aspect, the invention is an EMT having: an EMT inner surface forming an EMT cavity; an EMT outer surface; an EMT first end; and at least one indentation in the EMT outer surface at or near the EMT first end, the indentation adapted to receive a corresponding barb from a sleeve device. In another aspect, the invention is a sleeve device comprising; a sleeve inner surface formning a sleeve cavity adapted to receive an end of an EMT; a sleeve outer surface; a first sleeve end; at least one barb on the sleeve inner surface at or near the first sleeve end, the barb adapted to engage a corresponding indentation on the EMT.
    Type: Grant
    Filed: April 28, 2003
    Date of Patent: September 28, 2004
    Assignee: Jonn Maneely Company
    Inventor: David Ruffin Burnette
  • Patent number: 6793450
    Abstract: A system and method for transferring a canister of spent nuclear fuel from a transfer cask to a receiving cask. In one aspect, the system comprises a below grade opening adapted for receiving a cask; a platform positioned within the opening, the platform capable of vertical movement; and at least two jacks for vertically moving the platform; wherein the platform is capable of lowering the cask within the opening.
    Type: Grant
    Filed: February 5, 2002
    Date of Patent: September 21, 2004
    Assignee: Holtec International, Inc.
    Inventors: Krishna P. Singh, Stephen J. Agace
  • Patent number: 6767877
    Abstract: Silicon wafers are treated with chemicals during the manufacture of integrated circuits according to the method of the invnention in the apparatus of the invention which comprises a process tank for cleaning, rinsing, and/or drying silicon wafers; a first chemical supply vessel suitable for being pressurized, fluidly coupled to the process tank; a chemical flow sensor for electronically monitoring the flow rate of chemical from the first hemical supply vessel; a first chemical flow metering valve for electronically controlling the flow rate of chemical from the first chemical supply vessel; a supply of hot DI water fluidly coupled to the process tank; a hot water metering valve for electronically controlling the flow rate of hot DI water from the supply of the hot DI water; a supply of cold DI water fluidly coupled to the process tank; a cold water metering means for electronically controlling the flow rate of cold DI water from the supply of cold DI water; water flow sensor means for electronically monitorin
    Type: Grant
    Filed: January 18, 2002
    Date of Patent: July 27, 2004
    Assignee: Akrion, LLC
    Inventors: Chang Kuo, Ismail Kashkoush, Nick Yialamas, Gregory Skibinski
  • Patent number: 6766818
    Abstract: A system and method for ensuring constant concentration ratios in multi-fluid mixtures used in wafer processing steps. In one aspect the invention is a method for supplying a multi-fluid mixture to a process tank comprising: transporting a first fluid through a first supply line having means to control mass flow rate of the first fluid; transporting a second fluid through a second supply line having means to control mass flow rate of the second fluid; converging the first and second fluids to form a multi-fluid mixture; repetitively measuring the concentration levels of the first and second fluids in the multi-fluid mixture with a sensor; and upon the sensor detecting undesirable concentration levels of either the first or second fluid in the multi-fluid mixture, automatically adjusting the mass flow rate of at least one of the first and second fluids to achieve desired concentration levels.
    Type: Grant
    Filed: April 5, 2002
    Date of Patent: July 27, 2004
    Assignee: Akrion, LLC
    Inventors: Ismail Kashkoush, Richard Novak, Timothy J. Helmer
  • Patent number: 6754980
    Abstract: An apparatus for drying a generally flat substrate that has been cleaned has a rotatable support for supporting the substrate, a substrate drying assembly, and a controller. The substrate drying assembly includes a substrate drying assembly support arm, an outlet for applying liquid to an upper surface of the substrate, and an outlet for applying a drying vapor to the upper surface of the substrate. The substrate drying assembly is configured to position the liquid applying outlet and to position the vapor applying outlet above a portion of the substrate. The controller causes the substrate drying assembly to be retracted over the upper surface of the substrate at a faster rate near a center of the substrate than near a periphery of the substrate.
    Type: Grant
    Filed: June 12, 2002
    Date of Patent: June 29, 2004
    Assignee: Goldfinger Technologies, LLC
    Inventors: Jeffrey M. Lauerhaas, Thomas J. Nicolosi, Jr., Paul Mertens, William Fyen
  • Patent number: 6747097
    Abstract: Compositions comprising (A) non-branched polybutadiene having terminal hydroxyl functionality less than 2 per molecule by average; and (B) branched polybutadiene having terminal hydroxyl functionality more than 2 per molecule by average; the weight ratio of (A) to (B) being about 99:1 to 1:99. These compositions are reacted with organic polyisocyanates to form prepolymers which are cured by reaction with a chain extender such as a diol to produce cured resins which exhibit unexpectedly improved tear strength properties and themoplasticity with high modulus, and improved tackiness and shelf life for hot melt adhesives. The prepolymers have lower viscosity and better storage stability as compared with those from conventional branched polybutadienes of the (B) type. Alternatively, the compositions can be cured directly in a one-shot reaction with diisocyanates to form a polyurethane with the described combination of properties.
    Type: Grant
    Filed: July 26, 2002
    Date of Patent: June 8, 2004
    Assignee: Sartomer Technologies Company, Inc.
    Inventors: Herbert Chao, Nan Tian, Alain Drexler, John Schmidhauser
  • Patent number: 6732749
    Abstract: A system and method for reducing the amount of contaminants that come into contact with wafer substrates during the production of integrated circuit devices. The system allows for uniform overflow of processing liquid from a process tank while preventing contaminants from reentering the process tank and contacting the wafers. The system in one aspect comprises an inner weir with a top surface, and overflow wall with at least one recess having a bottom, and a structure, the structure connecting the overflow wall and the inner weir to form a drainage basin with at least one drain hole; wherein the top surface of the inner weir is below the bottom of the at least one recess.
    Type: Grant
    Filed: December 11, 2001
    Date of Patent: May 11, 2004
    Assignee: Akrion, LLC
    Inventor: Larry Myland
  • Patent number: 6722056
    Abstract: Drying semiconductor wafers or substrates by introducing an polar organic compound in liquid form into or onto means for enhancing evaporation within a process chamber and allowing the liquid to evaporate and form a drying vapor within the process chamber.
    Type: Grant
    Filed: March 15, 2002
    Date of Patent: April 20, 2004
    Assignee: Akrion, LLC
    Inventor: Lawrence J. Myland
  • Patent number: 6718000
    Abstract: An apparatus, system, and method of storing and transferring a canister of spent nuclear fuel. In one aspect, the apparatus is a lid for a ventilated vertical overpack having a chamber for receiving spent nuclear fuel, the lid having ventilation ducts. In one aspect, the system comprises: a lid for a ventilated vertical overpack having a chamber for receiving spent nuclear fuel, the lid having ventilation ducts; and a ventilated vertical overpack having a cylindrical body including lower ventilation ducts, a bottom, and a chamber formed by the body and the bottom adapted for receiving a canister of spent nuclear fuel.
    Type: Grant
    Filed: February 6, 2002
    Date of Patent: April 6, 2004
    Assignee: Holtec International, Inc.
    Inventors: Krishna P. Singh, Stephen Agace
  • Patent number: 6649018
    Abstract: A process and system for removing photoresist from semiconductor wafers comprises applying pressure in excess of one atmosphere to ozone, mixing the ozone with ambient temperature or higher deionized water via a sparger plate, and exposing the semiconductor wafers to the mixture of ozone and deionized water. The system is comprised of a tank capable of holding the semiconductor wafers, a sparger plate within the tank, a source of ozone connected to the tank, a source of deionized water connected to the tank; and finally a means for recirculating the deionized water connected to the tank. No chiller is included in the system as required by the prior art.
    Type: Grant
    Filed: January 17, 2002
    Date of Patent: November 18, 2003
    Assignee: Akrion, LLC
    Inventors: Richard Novak, Ismail Kashkoush
  • Patent number: 6626189
    Abstract: A method for stripping photoresist from semiconductor wafers. In one aspect, the invention is a method for processing integrated circuits comprising: placing at least one wafer having an edge in a process tank having a lid; closing the lid; filling the process tank with a process liquid to a predetermined level below the edge of the wafer; supplying a process gas under pressure to a remaining volume of the process tank; and applying acoustical energy to the process liquid so as to form a mist of process liquid in the process tank. Preferably, the process liquid is ozonated deionized water and the process gas is ozone.
    Type: Grant
    Filed: November 25, 2002
    Date of Patent: September 30, 2003
    Assignee: Akrion, LLC
    Inventors: Ismail Kashkoush, Richard Novak, Dennis Nemeth, Gim-Syang Chen
  • Patent number: 6625246
    Abstract: An apparatus, transfer cask, system, and method for defueling a nuclear reactor and transferring spent nuclear fuel from a spent nuclear fuel pool to a storage cask for long terms storage. In one aspect, the invention is an apparatus for use in transferring a canister of spent nuclear fuel from a transfer cask to a storage cask, the apparatus comprising a radiation absorbing shield surrounding a portion of a hole through which the canister can pass; means for securing the apparatus to the top surface of the storage cask; means for securing the bottom surface of the transfer cask to the apparatus; wherein the transfer cask securing means and the storage cask securing means are positioned on the apparatus so that when the apparatus is secured to both the transfer cask and the storage cask.
    Type: Grant
    Filed: April 12, 2002
    Date of Patent: September 23, 2003
    Assignee: Holtec International, Inc.
    Inventors: Krishna P. Singh, Stephen J. Agace
  • Patent number: 6619042
    Abstract: A power plant apparatus comprising a condenser for condensing turbine exhaust steam having a steam dome, a steam inlet, a tube bundle, a hot well for collecting condensate, an air removal section, an internal makeup water heater bundle. An internal makeup water header which includes a pipe having spray nozzles arranged counter-current to the flow of steam introduced by the steam inlet is used to introduce heated makeup water into the exhaust stream from the turbine within the condenser.
    Type: Grant
    Filed: October 1, 2001
    Date of Patent: September 16, 2003
    Assignee: Holtec International, Inc.
    Inventor: Ranga Nadig
  • Patent number: 6587536
    Abstract: An apparatus and method for maximizing the radiation shielding for spent nuclear fuel during cask transfer procedures. In one aspect, the method comprises submersing an apparatus having a jacket and a cavity for receiving spent nuclear fuel into a pool, wherein the jacket is empty and hermetically sealed; placing spent nuclear fuel into the cavity of the apparatus; lifting the apparatus from the pool; placing the apparatus in a staging area; filling the jacket with neutron absorbing liquid; draining the pool water from the cavity; and lifting the apparatus from the staging area.
    Type: Grant
    Filed: March 18, 2002
    Date of Patent: July 1, 2003
    Assignee: Holtec International, Inc.
    Inventors: Krishna P. Singh, Stephen J. Agace
  • Patent number: 6559260
    Abstract: The present invention is for a new class of allyl urethane resin which can be cured with peroxide at high temperature alone or in combination with some accelerators. These allyl urethane resins can be sued alone or in combination with other free radically polymerizable materials such as allyl monomers and ligomers or (meth)acrylate monomers and oligomers. These new allyl urethane resins contain at least two allyl functional groups.
    Type: Grant
    Filed: March 27, 2000
    Date of Patent: May 6, 2003
    Assignee: Sartomer Technology Company, Inc.
    Inventors: Mingxin Fan, Gary W. Ceska, James Horgan
  • Patent number: D484810
    Type: Grant
    Filed: April 12, 2001
    Date of Patent: January 6, 2004
    Assignee: New Dana Perfumes Corp.
    Inventor: Marc Rosen
  • Patent number: D487697
    Type: Grant
    Filed: April 12, 2001
    Date of Patent: March 23, 2004
    Assignee: New Dana Perfumes Corp.
    Inventor: Marc Rosen