Abstract: A method and apparatus for providing a shaped ion beam having low current density and sharp edges. The low current density and sharp edges eliminate the problem of overmilling, while permitting rapid ion beam processing. One method of producing the shaped beam is by using a two lens system, the first lens imaging the source onto the plane of the second lens and the second lens forming an image of the aperture onto the target plane. Another method is to greatly underfocus a chromatic aberration limited beam. Large beams having uniform current density and sharp edges can be produced. A knife edge beam, having a sharp edge can also be produced.
Type:
Grant
Filed:
January 19, 2001
Date of Patent:
September 27, 2005
Assignee:
FEI Company
Inventors:
Robert L. Gerlach, Mark W. Utlaut, Paul P. Tesch, Richard J. Young, Clive D. Chandler, Karl D. van der Mast
Abstract: A high resolution scanning electron microscope collects secondary Auger electrons through its objective lens to sensitively determine the chemical make-up with extremely fine positional resolution. The system uses a magnetic high resolution objective lens, such as a snorkel lens or a dual pole magnetic lens which provides an outstanding primary electron beam performance. The Auger electrons are deflected from the path of the primary beam by a transfer spherical capacitor. The primary beam is shielded, by a tube or plates, as it traverses the spherical capacitor to prevent aberration of the primary beam and the external wall of the shield maintains a potential gradient related to that of the spherical capacitor to reduce aberration of the primary electron beam. The coaxial configuration of the primary electron beam and the collected secondary electron beam allows the Auger image to coincide with the SEM view.
Type:
Grant
Filed:
April 23, 2001
Date of Patent:
September 20, 2005
Assignee:
FEI Company
Inventors:
Robert L. Gerlach, Karel D. van der Mast, Michael R. Scheinfein
Abstract: In relatively thick samples for electron microscopy imaging, details of interest are often located in the bulk of the sample, so that they cannot be directly imaged in the form of a SEM image. According to the invention, so as to expose the cross-section containing the details of interest, the frozen sample is subjected to ion milling, in such a manner that the desired cross-section is exposed. Thereafter, the exposed cross-section is further eroded in a controlled manner via sublimation, whereby the detail of interest is approached in a very accurate manner, and its fine details become visible. Hereafter, the finally desired SEM image can be made. By repetition of this process, a large number of successive cross-sections can be imaged, so that a spatial representation of the sample is obtained.
Type:
Grant
Filed:
September 2, 2003
Date of Patent:
May 3, 2005
Assignee:
FEI Company
Inventors:
Remco Theodorus Johannes Petrus Geurts, Michael Frederick Hayles
Abstract: A beam processing system, such as a focused ion beam or an electron beam system, addressing an arbitrary series of points and receives data from the points in real time. The data can be used to image or to alter the processing, even within a single dwell period, thereby allowing closed feedback loop for processing. A delay calculator automatically determines the delay between instructing the system to move the beam and detecting a signal from the work piece surface so that the detector signal can be matched with the location on the work piece at which the signal was generated.