Patents Represented by Attorney, Agent or Law Firm Michael I. Falkoff
  • Patent number: 6351938
    Abstract: A radial flow engine has at least one rotor with an internal cavity that includes a vaporization section and a condensation section. The condensation section is disposed radially inward toward the shaft and the vaporization section extends radially outward adjacent to the surface of the rotor blade. The vaporization section includes a series of pockets for dispersing the cooling fluid within each blade, and a cascaded series of capture protrusions to distribute the liquid coolant to the successive radially-arrayed pockets. A working system includes a centrifugal compressor which feeds a compressed air fuel mixture to an annular combustion chamber that, in turn, feeds the combustion gases along a radial direction to impinge on the surface of the cooled radial flow rotor. Optionally, the system is a regenerative system including a heat exchange sub-assembly which couples heat from the exhaust stream to a position between the compressor and combustion chamber.
    Type: Grant
    Filed: June 15, 2000
    Date of Patent: March 5, 2002
    Inventor: Jack L. Kerrebrock
  • Patent number: 6192670
    Abstract: A radial flow turbine has a rotor with an internal cavity that includes a vaporization section and a condensation section. The condensation section is disposed radially inward toward the shaft and the vaporization section extends radially outward adjacent to the surface of the rotor blade. The vaporization section includes a series of pockets for dispersing the cooling fluid within each blade, and a cascaded series of capture protrusions to distribute the liquid coolant to the successive radially-arrayed pockets. A working system includes a centrifugal compressor which feeds a compressed air fuel mixture to an annular combustion chamber that, in turn, feeds the combustion gases along a radial direction to impinge on the surface of the cooled radial flow rotor. Optionally, the system is a regenerative system including a heat exchange sub-assembly which couples heat from the exhaust stream to a position between the compressor and combustion chamber.
    Type: Grant
    Filed: June 15, 1999
    Date of Patent: February 27, 2001
    Inventor: Jack L. Kerrebrock
  • Patent number: 5398885
    Abstract: A sensor has a sensing region that responds to a surface property by producing an output signal. The sensor has a spatially distributed shape or sensitivity so that the output decreases away from a central part of the sensor, and thus the outputs of plural sensors combined have finite spatial transform as well as high roll off in spatial frequency. Preferably the output decreases to zero at edges of the sensor, and conditions of continuity or vanishing may be imposed on first or higher order derivatives. An edge sensor suitable for mounting at the edge of the structure has its weight function obtained by processes of reflecting and inverting the weight function at an edge. A sensor system employs plural such sensors and edge sensors to produce bounded spatial transfer functions for characterizing the structure. Embodiments of piezeoelectric, resistive, capacitive and thermal sensors are described.
    Type: Grant
    Filed: November 12, 1992
    Date of Patent: March 21, 1995
    Assignee: Massachusetts Institute of Technology
    Inventors: Mark S. Andersson, Edward F. Crawley
  • Patent number: 5362606
    Abstract: A resist exposed to a micron or sub-micron pattern of highly absorbed ion beams forms a highly crosslinked barrier layer in the exposed regions of the resist surface. The complementary surface regions are silylated in a silicon-containing reagent, and the exposed regions are then removed by a plasma etch. Pattern definition is enhanced by limiting the exposure and the silylation to the surface of the resist. The process allows feature definition below 1000 Angstroms using a relatively inexpensive single element low energy ion source.
    Type: Grant
    Filed: August 7, 1992
    Date of Patent: November 8, 1994
    Assignee: Massachusetts Institute of Technology
    Inventors: Mark A. Hartney, John Melngailis, David C. Shaver
  • Patent number: 5198881
    Abstract: A surface electron barrier region is formed on a semiconductor membrane device by a single step laser process which produces a sharp doping profile in a surface region above the light penetration depth. Enhanced quantum efficiency is observed, and by selectively forming barrier layers of differing depth, a CCD device architecture for two-color sensitivity is achieved. The barrier layer results in enhanced membrane-type and radiation hardened bipolar and CMOS devices.
    Type: Grant
    Filed: August 7, 1991
    Date of Patent: March 30, 1993
    Assignee: Massachusetts Institute of Technology
    Inventors: Jammy C. Huang, Mordechai Rothschild, Barry E. Burke, Daniel J. Ehrlich, Bernard B. Kosicki
  • Patent number: 5139925
    Abstract: A resist exposed to patterned radiation at 193 nm forms a highly crosslinked barrier layer in the exposed regions of the resist surface. The complementary surface regions are silylated in a silicon-containing reagent, and the exposed regions are readily removed by a oxygen RIE plasma. The laser exposure is a reciprocal process allowing precise control. Pattern definition is enhanced by limiting the exposure and the silylation to the surface of the resist.
    Type: Grant
    Filed: October 18, 1989
    Date of Patent: August 18, 1992
    Assignee: Massachusetts Institute of Technology
    Inventor: Mark A. Hartney
  • Patent number: 5104684
    Abstract: Metal is deposited in lines of submicron width by scanning a focused ion beam along a substrate in the presence a vapor of a precursor platinum compound. High deposition rates and steep walls may be obtained by milling a cavity or trench with the focused beam and then locally applying the precursor vapor while scanning of the beam continues. Platinum containing features deposited in this way extend horizontally between wires, or vertically between layers to form conductive interconnects in integrated circuits, and also form pattern repairs in x-ray masks. The platinum chemistry is compatible with silicon wafer processing.
    Type: Grant
    Filed: May 25, 1990
    Date of Patent: April 14, 1992
    Assignee: Massachusetts Institute of Technology
    Inventors: Tao Tao, John Melngailis
  • Patent number: 4958100
    Abstract: A truss member includes a piezoelectric stack and a cylindrical shell formed of composite material surrounding the stack and bonded thereto, such that the axial load is distributed between the shell and the stack. The truss is fitted to a structural assembly via end pieces, and electrodes are attached to the stack, which may be selectively actuated to achieve different effects. In one aspect, a shunt or resonant feedback circuit damps a truss resonance mode; in another aspect an electrode bus attached to partial electrode surfaces on the stack allows the selective excitation of bending moments. The composite shell shields the stack from the environment, resulting in a robust control structure of low effective mass.
    Type: Grant
    Filed: February 22, 1989
    Date of Patent: September 18, 1990
    Assignee: Massachusetts Institute of Technology
    Inventors: Edward F. Crawley, Nesbitt Hagood