Abstract: A stress detection apparatus is provided. A piece of semiconductor grade, ngle crystal silicon mounted on the material is illuminated by an infrared source with radiation having a wavelength in the range of 800-1100 nanometers. An infrared detector monitors the photoelastic effects of illuminating the single crystal silicon with the radiation.
Type:
Grant
Filed:
January 17, 1996
Date of Patent:
March 17, 1998
Assignee:
The United States of America as represented by the Secretary of the Navy