Patents Represented by Attorney Michael Plimier

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  • EUV mask blank defect mitigation
    Patent number: 6908713
    Abstract: A solution for mitigating the effects of EUV substrate surface defects is disclosed. In one embodiment, a layer of polyimide material is formed upon a mask substrate surface, resulting in a substantially defect free surface adjacent to which a reflective multilayer may be positioned for EUV lithography. To reduce the possibility of polyimide outgassing and resultant added roughness to adjacently positioned layers, the layer of polyimide may be cured in a vacuum at an elevated temperature before other layers are adjacently positioned.
    Type: Grant
    Filed: February 5, 2003
    Date of Patent: June 21, 2005
    Assignee: Intel Corporation
    Inventor: Peter J. Silverman