Abstract: The present invention is directed to a method of forming a new material layer or region near an interface region of two dissimilar materials, and an optional third layer, wherein at least one of said dissimilar materials or optional third is capable of being heated by microwave energy. The method of the present invention includes a step of irradiating a structure containing at least two dissimilar materials and an optional third layer under conditions effective to form the new material layer in the structure. An apparatus for conducting the microwave heating as well as the structures formed from the method are also described herein.
Type:
Grant
Filed:
January 27, 2000
Date of Patent:
November 13, 2001
Assignee:
International Business Machines Corporation
Inventors:
Kam Leung Lee, David Andrew Lewis, Ronnen Andrew Roy, Raman Gobichettipalayam Viswanathan