Abstract: A polycrystalline silicon TFT for an LCD and a manufacturing method thereof is disclosed. The TFT comprises an active pattern formed on a substrate, a gate insulating layer formed on the substrate including the active pattern, a gate line formed on the gate insulating layer to be crossed with the active pattern and including a gate electrode for defining the first impurity region, a second impurity region and a channel region, an insulating interlayer formed on the gate insulating layer including the gate line, a data line formed on the insulating interlayer and connected to the second impurity region through the first contact hole which is formed through the gate insulating layer and the insulating interlayer on the second impurity region and a pixel electrode formed on the same insulating interlayer as the data line and connected with the first impurity region through a second contact hole which is formed through the gate insulating layer and the insulating interlayer on the first impurity region.
Type:
Grant
Filed:
April 24, 2002
Date of Patent:
November 23, 2004
Assignee:
Samsung Electronics Co., LTD
Inventors:
Chang-Won Hwang, Woo-Suk Chung, Tae-Hyeong Park, Hyun-Jae Kim, Gyu-Sun Moon, Sook-Young Kang