Patents Represented by Attorney Nugent & Smtih, LLP.

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  • Topcoat material and use thereof in immersion lithography processes
    Patent number: 7521172
    Abstract: Disclosed is a topcoat composition comprising a polymer having a dissolution rate of at least 1500 ?/second in an aqueous alkaline developer, and at least one solvent. The topcoat composition can be used to coat a photoresist layer on a material layer on a substrate, for example, a semiconductor chip. Also disclosed is a method of forming a pattern in the material layer of the coated substrate.
    Type: Grant
    Filed: April 28, 2006
    Date of Patent: April 21, 2009
    Assignee: International Business Machines Corporation
    Inventors: Robert Allen David, Phillip Joe Brock, Sean David Burns, Dario Leonardo Goldfarb, David Medeiros, Dirk Pfeiffer, Matt Pinnow, Ratnam Sooriyakumaran, Linda Karin Sundberg