Abstract: A source-collector module (SOCOMO) for generating a laser-produced plasma (LPP) that emits EUV radiation, and a grazing-incidence collector (GIC) mirror arranged relative to the LPP and having an input end and an output end. The LPP is formed using an LPP target system having a light source portion and a target portion, wherein a pulsed laser beam from the light source portion irradiates a rotating Sn rod in the target portion to generate the EUV radiation. The GIC mirror is arranged relative to the LPP to receive the EUV radiation at its input end and focus the received EUV radiation at an intermediate focus adjacent the output end. A radiation collection enhancement device having at least one funnel element may be used to increase the amount of EUV radiation provided to the intermediate focus and/or directed to a downstream illuminator. An EUV lithography system that utilizes the SOCOMO is also disclosed.

Abstract: Key management and user authentication systems and methods for quantum cryptography networks that allow for users securely communicate over a traditional communication link (TC-link). The method includes securely linking a centralized quantum key certificate authority (QKCA) to each network user via respective secure quantum links or “Q-links” that encrypt and decrypt data based on quantum keys (“Q-keys”). When two users (Alice and Bob) wish to communicate, the QKCA sends a set of true random bits (R) to each user over the respective Q-links. They then use R as a key to encode and decode data they send to each other over the TC-link.

Abstract: A source-collector module for an extreme ultraviolet (EUV) lithography system, the module including a laser-produced plasma (LPP) that generates EUV radiation and a grazing-incidence collector (GIC) mirror arranged relative thereto and having an input end and an output end. The LPP is formed using an LPP target system wherein a pulsed laser beam travels on-axis through the GIC and is incident upon solid, moveable LPP target. The GIC mirror is arranged relative to the LPP to receive the EUV radiation therefrom at its input end and focus the received EUV radiation at an intermediate focus adjacent the output end. An example GIC mirror design is presented that includes a polynomial surface-figure correction to compensate for GIC shell thickness effects, thereby improve far-field imaging performance.

Abstract: A phase-shift mask having a checkerboard array and a surrounding sub-resolution assist phase pattern. The checkerboard array comprises alternating phase-shift regions R that have a relative phase difference of 180 degrees. The sub-resolution assist phase regions R? reside adjacent corresponding phase-shift regions R and have a relative phase difference of 180 degrees thereto. The sub-resolution assist phase regions R? are configured to mitigate undesirable edge effects when photolithographically forming photoresist features. Method of forming LEDs using the phase-shift mask are also disclosed.

Abstract: Systems and methods for performing ultrafast laser annealing in a manner that reduces pattern density effects in integrated circuit manufacturing are disclosed. The method includes scanning at least one first laser beam over the patterned surface of a substrate. The at least one first laser beam is configured to heat the patterned surface to a non-melt temperature Tnonmelt that is within about 400° C. of the melt temperature Tmelt. The method also includes scanning at least one second laser beam over the patterned surface and relative to the first laser beam. The at least one second laser beam is pulsed and is configured to heat the patterned surface from the non-melt temperature provided by the at least one first laser beam up to the melt temperature.

Abstract: Sub-field enhanced global alignment (SEGA) methods for aligning reconstituted wafers in a lithography process are disclosed. The SEGA methods provide the ability to accommodate chip placement errors for chips supported by a reconstituted wafer when performing a lithographic process having an overlay requirement. The SEGA methods include measuring chip locations to determine sub-fields of the reconstituted wafer over which enhanced global alignment (EGA) can be performed on the chips therein to within the overlay requirement. The SEGA methods further included individually performing EGA over the respective sub-fields. The SEGA methods take advantage of the benefits of both EGA and site-by-site alignment and are particularly applicable to wafer-level packing lithographic processes such as fan-out wafer-level packaging.

Abstract: An extended depth-of-field (EDOF) surveillance imaging system (8) that has a lens system (10) with a total lens power ?T and an amount of spherical aberration SA where 0.2??SA?2?. The lens system includes first lens group (G1) and a second lens group (G2). The first lens group has first and second confronting meniscus lens elements (L1, L2) that have an overall optical power ?1 such that |?1/?T|?0.05. The second lens group has a doublet (D1) and a most imagewise positive lens element (L5). An aperture stop (AS) is arranged either between the first and second lens groups or within the second lens group. An image sensor (30) is arranged to receive the image and form therefrom a digitized electronic raw image. An image processor receives and digitally filters the digitized electronic raw image to form a digitized contrast-enhanced image.

Abstract: Imaging optical systems having good transmission and that are well corrected over the full 315 nm-1100 nm ultraviolet-visible-infrared (UV-VIS-IR) wavelength band are disclosed. A wide variety of apochromatic and superachromatic design examples are presented. The imaging optical systems have a broad range of applications in fields where large-bandwidth imaging is called for, including but not limited to forensics, crime scene documentation, art conservation, forgery detection, medicine, scientific research, remote sensing, and fine art photography.

Abstract: A microscope, in particular a scanning probe microscope, comprising a programmable logic device.

Abstract: An adjustable clip for securing a grazing-incident collector (GIC) shell to a spider having spokes is disclosed. The clip includes a base adapted to be secured to a spider spoke and having an upper surface. The clip includes a fork member having two prongs each with end pads at respective prong ends, and having a first hinge portion at an end opposite the prong ends. A hinge leaf is secured to the base upper surface and has a second hinge portion that operably engages the first hinge portion, thereby forming a hinge that allows for rotatable adjustment of the fork member relative to the base. Movement of the GIC shell when performing optical alignment is accommodated by the clip self-adjusting by its end pads moving over the GIC shell outer surface. When GIC shell alignment is achieved, the end pads are secured to the GIC shell outer surface, thereby turning the clip into a rigid support member that secures the GIC shell in place relative to the spider.

Abstract: A cooled spider for grazing-incidence collectors includes an outer ring, an inner ring and spokes that mechanically and fluidly connect the inner and outer rings. Cooling channels in the outer and inner rings and in the spokes define a general cooling-fluid flow path through the spider. The general cooling-fluid flow path has input and output points located substantially 180° apart so that the flow path diverges at the input point into two branch flow paths that flow in opposite directions through the spider, and then converge at the output point. Input and output cooling fluid manifolds are fluidly connected to the outer ring at the input and output points and serve to flow cooling fluid over the cooling-fluid flow path.

Abstract: A source-collector module (SOCOMO) for generating a laser-produced plasma (LPP) that emits EUV radiation, and a grazing-incidence collector (GIC) mirror arranged relative to the LPP and having an input end and an output end. The LPP is formed using an LPP target system having a light source portion and a target portion, wherein a pulsed laser beam from the light source portion irradiates Xenon liquid in the target portion. The GIC mirror is arranged relative to the LPP to receive the EUV radiation at its input end and focus the received EUV radiation at an intermediate focus adjacent the output end. A radiation collection enhancement device having at least one funnel element may be used to increase the amount of EUV radiation provided to the intermediate focus and/or directed to a downstream illuminator. An EUV lithography system that utilizes the SOCOMO is also disclosed.

Abstract: Aerogel-based optical elements are disclosed. The aerogel-based optical elements have an aerogel member having at least one surface, and at least one optical surface disposed on the at least one aerogel member surface. The at least one optical surface comprises an electroformed metal or at least one glass sheet. The at least one optical surface can be transmissive, reflective, or both. Different types of aerogel-based optical elements are presented, along with various methods of making the aerogel-based optical elements.

Abstract: A medical voice data system includes a hand-held recording device, an electronic information carrier (EIC), and a host station. The hand-held device records medical information from a user that is examining a person in an extreme environment such as battlefield or disaster area. EICs are stored within a housing interior and can be dispensed therefrom by the user. Recording electronics within the housing interior are operably connected to at least one of the EICs. A microphone is operably connected to the recording electronics to record on a EIC medical information about the injured person. The EIC is configured to be attached to and travel with the person as they are evacuated so that the recorded medical information is immediately available to medical personnel at a care center via the host station. The medical voice data system may also employ a wireless EIC. A host station is used to receive and process the recorded information and convert it to text-based medical record.

Abstract: Large aperture optical systems that are extremely well corrected over a large flat field and over a large spectral range are disclosed. Breathing and aberration variation during focusing are optionally controlled by moving at least two groups of lens elements independently. Aberration correction in general is aided by allowing the working distance to become short relative to the format diagonal. Field curvature is largely corrected by a steeply curved concave surface relatively close to the image plane. This allows the main collective elements to be made of low-index anomalous dispersion materials in order to correct secondary spectrum. In wide-angle example embodiments, distortion may be controlled with an aspheric surface near the front of the lens.

Abstract: A cooling system (10) for an extreme ultraviolet (EUV) grazing incidence collector (GIC) mirror assembly (240) having at least one shell (20) with a back surface (22) is disclosed. The cooling system has a plurality of spaced apart circularly configured cooling lines (30) arranged in parallel planes (PL) that are perpendicular to the shell central axis (AC) and that are in thermal contact with and that run around the back surface. Input and output secondary cooling-fluid manifolds (44, 46) are respectively fluidly connected to the plurality of cooling lines to flow a cooling fluid from the input secondary cooling-fluid manifold to the output cooling secondary fluid manifold over two semicircular paths for each cooling line. Separating the cooling fluid input and output locations reduces thermal gradients that can cause local surface deformations in the shell that can lead to degraded focusing performance.

Abstract: A process for fabricating a reflective optical system is disclosed that includes providing first and second mandrels that form a mandrel assembly, and positioning the mandrel assembly in an electroforming bath. The process also includes performing an electroforming operation for a predetermined period, thereby forming an optical system on the mandrel assembly. The process further involves separating the mandrel assembly from the optical system. The resulting optical system is reflective and has at least first and second elongate hollow sections each having an axis corresponding to the axis of elongation of a respective mandrel. The reflective optical system may be used as an afocal relay and used in lithography applications.

Abstract: A method of autocalibrating the timing of the laser in a quantum key distribution (QKD) system is disclosed. The laser generates photon signals in response to a laser gating signals from a controller. The method includes first performing a laser gate scan to establish the optimum laser gating signal arrival time corresponding to an optimum bit-error rate when exchanging photon signals between encoding stations of the QKD system. Once the optimum laser gating signal arrival time is determined, the laser gate scan is terminated and laser gate dithering is initiated. Laser gate dithering involves varying the arrival time of the laser gating signal around the optimum value of the arrival time. Laser gate dithering provides minor adjustments to the laser gating signal arrival time to ensure that the system operates at or near the optimum bit-error rate.

Abstract: An alignment tool for use in calibrating an optical bench and/or alignment of an optical system such as a collector optical system for EUV and X-ray applications is disclosed. The optical system includes multiple nested mirrors attached to a mechanical support.

Abstract: A method of aligning a wafer when lithographically fabricating a light-emitting diode (LED). The method includes forming on the wafer at least one roughened alignment mark having a root-mean-square (RMS) surface roughness ?S. The roughened alignment mark is formed as a consequence of forming a plasma etch to roughen a LED surface on which the wafer alignment mark resides. The method also includes imaging the at least one roughened wafer alignment mark with alignment light having a wavelength ?A that is in the range from about 2?S to about 8?S. The method also includes comparing the detected image to an alignment reference to establish wafer alignment. Once wafer alignment is established, p-contacts and n-contacts can be formed on the LED upper surface in their proper locations.