Patents Represented by Attorney Pattersib & Sheridan, LLP

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  • Apparatus and method to confine plasma and reduce flow resistance in a plasma
    Patent number: 7754997
    Abstract: An apparatus configured to confine a plasma within a processing region in a plasma processing chamber. In one embodiment, the apparatus includes a ring that has a baffle having a plurality of slots and a plurality of fingers. Each slot is configured to have a width less than the thickness of a plasma sheath contained in the processing region.
    Type: Grant
    Filed: October 25, 2007
    Date of Patent: July 13, 2010
    Assignee: Applied Materials, Inc.
    Inventors: Kallol Bera, Yan Ye, James D. Carducci, Daniel J. Hoffman, Steven C. Shannon, Douglas A. Buchberger, Jr.