Abstract: A cleaning tool to clean a surface of a liquid confinement system of an immersion lithographic apparatus is disclosed, the liquid confinement system having an aperture to allow passage of a beam of radiation therethrough of an immersion lithographic apparatus. The cleaning tool includes a sonic transducer, a reservoir configured to hold liquid between the sonic transducer and the surface to be cleaned, and a barrier positioned in the reservoir under the aperture to form, in use, a shield to sonic waves.
Type:
Grant
Filed:
April 11, 2008
Date of Patent:
January 11, 2011
Assignee:
ASML Netherlands B.V.
Inventors:
Bauke Jansen, Raymond Gerardus Marius Beeren, Anthonius Martinus Cornelis Petrus De Jong, Kornelis Tijmen Hoekerd