Abstract: The present invention relates to a color filter structure and to a method for manufacturing the color filter, and the method is to use the combination of photolithography and backside exposure in a self-alignment manner to form flat red color filter elements, green color filter elements and blue color filter elements, and then to form a black matrix on the top of a transparent conductive layer, i.e., the transparent conductive layer is located between the black matrix and the color filter elements, so as to increase the open ratio and reduce the errors in applying a process window.