Abstract: A method employing a photolithography mask for producing microtextured antireflective surfaces is disclosed. The photolithography mask is used during the exposure of photoresist to a pattern of ultraviolet light. The exposed photoresist is subsequently processed to obtain a microtextured surface possessing antireflective properties. The antireflective surface profile comprises an array of sub-micron protuberances that may reside in a periodic arrangement, a quasiperiodic arrangement, or in an arbitrary non-periodic arrangement. The antireflective surface is designed for visible light. It may be scaled-up to large areas, and is suitable for replication into inexpensive polymer materials.

Abstract: The present invention is a safety device used in an infant crib or playpen to protect its occupant from the individual hard (typically) wood vertical support posts (i.e., slats). A padded cushion is fastened around the entire crib slat, and has a solid, vertical support piece which is used to stabilize the pad in an upright, fixed position at all times. The safety support piece (i.e. stabilizing object) prevents an infant or toddler from pushing down on the pad and using it as a step to climb out of the crib.