Abstract: A semiconductor mesa device having reduced leakage current comprises a moat substantially completely filled with a passivating material. A layer of conductive material overlies the passivating material and is spaced apart from the adjacent semiconductor material. Such a structure is particularly advantageous for use in low current devices.
Abstract: A method of testing semiconductor devices at low temperatures comprises the steps of first directing a relatively cold fluid upon the device for a time long enough to reduce the temperature thereof below the temperature at which it is to be tested, then internally heating the device to the test temperature and then performing a test at the testing temperature.
Abstract: A method is disclosed whereby a region having a varying conductivity profile and depth is formed in a body of semiconductor material. The method includes the step of implanting conductivity modifiers beneath a curved surface of the body. Such a region, fabricated by the present method, is particularly useful as one element of a semi-conductor device.
Abstract: A machine for changing the spacing of a plurality of wafers comprises a plurality of wafer receiving surfaces initially having a first spacing associated therewith. The wafer receiving surfaces cooperatively engage with means which, when activated, move the plurality of wafer receiving surfaces so that they have a second spacing associated therewith.
Type:
Grant
Filed:
September 28, 1977
Date of Patent:
August 22, 1978
Assignee:
RCA Corporation
Inventors:
Robert Charles Shambelan, Charles Wesley Lindsley
Abstract: A machine for straightening a wire lead or leads of a device comprises first and second opposing jaws affixed to a base. The first jaw and second jaw, when meshed, exert lateral straightening forces on the leads, and a slot disposed near the base of the leads is provided to prevent the fracture of the leads during the straightening operation and this slot also aligns the leads when there are more than one.
Type:
Grant
Filed:
June 6, 1977
Date of Patent:
August 15, 1978
Assignee:
RCA Corporation
Inventors:
Nicholas Francis Gubitose, Robert Arthur James
Abstract: A chuck for use in the testing of semiconductor wafers comprising first and second pluralities of electrically conductive members alternately arranged to provide a wafer receiving surface. The members are substantially completely electrically isolated from each other. Electric power leads and measurement sensing leads are provided to the first plurality of conductive members and the second plurality of conductive members respectively.
Type:
Grant
Filed:
October 7, 1976
Date of Patent:
August 1, 1978
Assignee:
RCA Corporation
Inventors:
Robert Lee Baker, Calvin Michael Mahoski, John David Partilla, Harold Robert Ronan, Jr.
Abstract: A method of fabricating a semiconductor device having a one type conductivity portion substantially surrounded by a second type conductivity portion is disclosed. The method involves selectively diffusing different impurities having the same conductivity inducing effect. The disclosed method is particularly adaptable to forming a plurality of devices in a relatively thick semiconductor wafer.
Abstract: A semicondutor device has an electrode with a configuration having a trunk portion and at least one comb-like portion. The comb-like portion has a back with ends and a plurality of conductive fingers extending therefrom. The trunk portion has a segment which is substantially parallel to the back of the comb-like portion. The trunk portion contacts the comb-like portion at a point intermediate the ends of the back.
Abstract: An improved integrated transistor device has reverse bias breakdown protection for the base-collector junction. The base-collector junction is protected by means of a diode region providing a punchthrough protective mode of operation. The configuration disclosed provides a device which has comparatively stable and relatively high energy junctions therein.
Abstract: A machine for separating a sheet of brittle material, for example a semiconductor wafer, into a plurality of pellets is disclosed. The pellets are defined by a plurality of intersecting scribed lines on the sheet. The machine includes a member for applying a shear force to an edge of the sheet whereby the maximum bending moment is applied at a preselected scribe line. The machine is particularly applicable for use with those semiconductor wafers which have a solder coating on both sides.
Type:
Grant
Filed:
September 29, 1975
Date of Patent:
January 17, 1978
Assignee:
RCA Corporation
Inventors:
Nicholas Francis Gubitose, Leonard Gawelko, Robert Joseph Satriano
Abstract: A method of fabricating a semiconductor device comprises steps for forming recesses which can be used in the subsequent visual alignment of photomasks. The novel recess forming steps are so linked with a conventional processing step that the total number of steps required for the formation of the recesses is reduced. The present method is particularly adaptable to the fabrication of unisurface silicon controlled rectifiers wherein a doped isolation-type grid is formed to define each device.
Abstract: Semiconductor thyristor devices with means, inherent in the structure thereof, for protecting the devices against damage due to breakover. The means requires, in a semiconductor controlled rectifier device, for example, that the active gate region have a comparatively smaller total charge than the adjacent base layer separating the active gate region from the anode layer.
Abstract: In semiconductor controlled rectifiers which can be of otherwise conventional design and configuration, a layer of relatively high resistivity material is disposed between the base region to which the gate electrode is connected and the otherwise immediately adjacent emitter region.
Abstract: A silicon substrate is coated with a mask comprised of the combination of a silicon dioxide layer and a layer of undoped polycrystalline silicon. Aluminum is then diffused through windows formed in the mask. The mask has proven effective for relatively deep aluminum diffusion.
Abstract: A high voltage semiconductor device structure comprises a novel edge contour which directly contributes to increased voltage handling capability. Such a structure may further comprise a collector region shaped in coordination with the edge contour to provide a device having higher voltage capability.
Abstract: A novel package for semiconductor components is disclosed. The package eliminates the need for covers or plugs at both ends of a hollow body wherein the components are placed. The novel package is easily adapted to provide anti-static protection for components susceptible to damage from electrostatic discharges across the terminals thereof.
Abstract: A pressure sensitive field effect semiconductor device which is one element of an integrated array is disclosed. The device employs a layer of elastomer material located substantially between the gate and the current carrying channel, to effectuate the conversion of a longitudinal pressure variation to an electrical variation. The device may inherently include amplification of the electrical variation. One use for the device is in an acoustic wave detector array.
Abstract: A semiconductor integrated circuit device which may be utilized as a Darlington circuit having an input stage and an output stage is disclosed. The Darlington may be characterized as having an increased isolation between the input stage and the output stage.
Type:
Grant
Filed:
May 21, 1976
Date of Patent:
July 12, 1977
Assignee:
RCA Corporation
Inventors:
Willem Gerard Einthoven, Anthony Joseph Caravaggio, Albert Alexander Todd
Abstract: A method for producing a pattern on a semiconductor wafer during the fabrication of semiconductor devices, including integrated circuits is disclosed. A master is pressed into a layer of moldable material which is on the wafer surface to define a pattern of at least one relatively thin region and relatively thick regions therein with a high degree of definition. Thereafter the whole layer is treated, for example, to remove, by etching for example, a relatively thin region to expose a portion of the wafer surface, the relatively thick regions remaining on the wafer surface.
Abstract: A semiconductor device comprising a plurality of cells is disclosed. Each cell contains at least one bi-polar transistor and a diode serially connected to the base of the transistor therein. Each cell is connected in parallel relation with each other cell. The diode in each cell is located in close proximity to the transistor therein so that the thermal gradient therebetween is small.