Abstract: A method and composition for treating a subterranean formation with a fluid, including forming a fluid including a particulate and an organosilane with the chemical formula RnSiX4-n, wherein n is equal to 1, 2, or 3, R is an organic functional group, and X is a halogen, alkoxy, or acetoxy group, introducing the fluid into a subterranean formation with exposed surfaces, and modifying the wettability of a surface of the particulate or subterranean formation or both. A method and composition for treating a subterranean formation with a fluid including forming a fluid comprising a particulate and an organosilane, introducing the fluid into a subterranean formation with exposed surfaces, and modifying the wettability of the proppant or surfaces or both, wherein the wettability modification degrades.