Abstract: A transistor structure (10), memory array (150) using the transistor structure, and method for making it are presented. The memory array (150), on a semiconductor substrate (152), contains a plurality of substantially parallel bit lines (154,155). A plurality of channel regions in the substrate (152) are bounded in one direction by a sets of bit line pairs (154,155). A conductive field shield layer (160), over a first insulation layer (156), is patterned to provide electrical regions over the channel regions between the first alternate sets of the bit lines (154,155) to form isolation transistor structures when biased with respect to the substrate (152). The field shield layer (160) is patterned to expose the channel regions of the memory transistors (151, . . . , 151'") between second alternate sets of the bit lines (155,154). A second insulating layer (163) is formed over the field shield layer (160).

Abstract: A semiconductor memory array having a plurality of rows of memory cells, a word line, which extends into at least two memory blocks, to carry drive signals, such as read select and deselect signals, erase select and deselect signals, and program select and deselect signals for selective delivery to a subword line. Two pairs of subword lines and associated drivers are arranged with each pair selectively connectible to a portion of the word line within the block containing the subword line pair and to an associated set of memory cells. Each subword line driver selectively delivers drive signals from the word line to a respective, selected one of the subword lines. The subword lines and their drivers are arranged to extend from opposite sides into the block with which the subword line pairs are associated to reduce the layout size necessary, and to enable fewer word line drivers to be needed for a particular layout pitch.