Abstract: This application discloses a method for distinguishing targets from clutter, comprising the steps of inputting data, extracting feature information from said data, extracting parameter information from said data, normalizing said features with said parameter information to produce parameter normalized feature information, inputting said parameter normalized feature information into the classification procedure, operating said classification procedure on said parameter normalized feature information, and outputting target and clutter data. Classification systems are also disclosed.
Abstract: A method and apparatus for doping silicon spheres (48) with a solid phosphorous source (41, 42) is disclosed. Two solid sheets (41, 42) of solid phosphorous source are held in a chamber (32) and aligned substantially parallel to one another for holding the plurality of silicon spheres therebetween. The chamber (32) temperature is increased to vaporize the sheets (41 and 42) to evenly diffuse phosphorous vapor into the silicon spheres (48).
Abstract: The ion beam which performs the printing on the resist through the mask is also used to perform the alignment function. Alignment marks are initially provided on the wafer of a material which emits light when an ion beam impinges thereon, such as silicon dioxide. An ion mask, preferably of silicon, is then positioned over the wafer and alignment marks and ions are directed to the alignment marks through the mask. The degree of alignment is determined by the amount of light emitted by the alignment marks since more ions will strike the alignment marks with increased alignment. The emitted light is detected and +X, -X, +Y, -Y and +theta and -theta error signals are provided on a continuous basis for closed loop control of the mask relative to the wafer under proper alignment is achieved.
Type:
Grant
Filed:
March 6, 1991
Date of Patent:
November 3, 1992
Inventors:
David P. Stumbo, John C. Wolfe, John N. Randall