Abstract: A silicon carbide epitaxial film, grown on an offcut surface of a SiC crystalline substrate of hexagonal crystal form, having an offcut angle of from about 6 to about 10 degrees, toward the <1{overscore (1)}00> crystalline direction of the substrate. The resultant silicon carbide epitaxial film has superior morphological and material properties.
Type:
Grant
Filed:
June 24, 1999
Date of Patent:
December 11, 2001
Assignee:
Advanced Technology Materials, Inc.
Inventors:
Barbara E. Landini, George R. Brandes, Michael A. Tischler