Abstract: Embodiments of the instant invention are directed to laser exposure system that employs a pulsed solid state laser to provide a reactive response wavelength and a pulse repetition rate specifically optimized for application to solidification of a liquid photopolymer in a stereolithographic process. The solid state laser employs two second harmonic crystals for generating an emission wavelength at about 320-345 nm and a pulse repetition rate, wherein the pulse repetition rate is selected such that a pulse separation at the target surface results which is less than a diameter of the beam when the beam is being scanned at a desired velocity and an average exposure deposited by the beam is equal to a desired amount.