Patents Represented by Attorney, Agent or Law Firm Roger E. Gobrogge
  • Patent number: 5364920
    Abstract: The present invention describes a novel method for crosslinking polysilazane polymers having Si--H or N--H bonds. The method comprises mixing the polysilazane with a silazane crosslinker having at least 2 boron functional groups which can react with the Si--H or N--H bonds of the polysilazane and then facilitating crosslinking.
    Type: Grant
    Filed: August 16, 1993
    Date of Patent: November 15, 1994
    Assignee: Dow Corning Corporation
    Inventors: Duane R. Bujalski, Gregg A. Zank, Thomas D. Barnard
  • Patent number: 5358910
    Abstract: The preparation of porous ceramic bodies by sintering certain curable organopolysiloxanes filled with silicon carbide powders. This process is advantageous in that the green bodies have relative high strengths and thus can be easily handled and, if desired, machined before sintering.
    Type: Grant
    Filed: September 20, 1993
    Date of Patent: October 25, 1994
    Assignee: Dow Corning Corporation
    Inventors: William H. Atwell, Chandan K. Saha, Gregg A. Zank
  • Patent number: 5358674
    Abstract: Ceramic SiCO fibers are formed by spinning a mixture of a substantially linear polysiloxane fluid having unsaturated hydrocarbon substituents and a photoinitiator into a fiber, exposing the fiber to radiation, and heating the fiber in an inert environment to a temperature above about 800.degree. C.
    Type: Grant
    Filed: March 18, 1993
    Date of Patent: October 25, 1994
    Assignee: Dow Corning Corporation
    Inventor: James A. Rabe
  • Patent number: 5358739
    Abstract: A silica coating is formed on an electronic substrate by applying a silazane polymer on the substrate and converting it to silica by heating in an oxidizing environment. The resultant thick planarizing coatings are useful as protective coatings and dielectric inner layers.
    Type: Grant
    Filed: March 10, 1994
    Date of Patent: October 25, 1994
    Assignee: Dow Corning Corporation
    Inventors: Ronald H. Baney, Grish Chandra, Loren A. Haluska
  • Patent number: 5348773
    Abstract: This invention relates to a method of forming a threshold switching device which exhibits negative differential resistance and to the devices formed thereby. The method comprises depositing a silicon dioxide film derived from hydrogen silsesquioxane resin between at least two electrodes and then applying a voltage above a threshold voltage across the electrodes.
    Type: Grant
    Filed: June 28, 1993
    Date of Patent: September 20, 1994
    Assignee: Dow Corning Corporation
    Inventors: Keith W. Michael, Udo C. Pernisz
  • Patent number: 5348839
    Abstract: Disclosed are compositions which are useful for forming photodelineable coatings on substrates. The compositions contain a solvent, hydrogen silsesquioxane resin and an initiator which generates free radicals upon exposure to radiation.
    Type: Grant
    Filed: March 22, 1993
    Date of Patent: September 20, 1994
    Assignee: Dow Corning Corporation
    Inventors: Loren A. Haluska, Keith W. Michael
  • Patent number: 5338817
    Abstract: Disclosed is a method for the preparation of high molecular-weight silicone resins that have excellent storage stability in solution form. The method comprises the hydrolysis and condensation of a disiloxane and an alkyl silicate in an aqueous solution which contains at least 30 weight % alcohol and at least 5 weight % inorganic acid followed by isolation of the resin with an organic solvent which is poorly soluble in water and which has a dielectric constant of at least 4.
    Type: Grant
    Filed: November 23, 1993
    Date of Patent: August 16, 1994
    Assignee: Dow Corning Toray Silicone Co., Ltd.
    Inventors: Katsutoshi Mine, Takashi Nakamura, Motoshi Sasaki
  • Patent number: 5339211
    Abstract: An electrical or electronic circuit having at least one variable capacitor device connected in parallel relationship in the circuit by at least a pair of electrodes. The improvement constitutes the capacitor device being in the form of a silicon dioxide film derived from the oxidation of a hydrogen silsequioxane resin. The silicon dioxide film is characterized by a non-linear substantially symmetrical jV curve which includes a threshold voltage at which the silicon dioxide film undergoes a reversible transition from insulating to conducting. The jV curve further includes a regime of negative differential resistance in which an increase in the voltage applied to the silicon dioxide film above the threshold voltage causes a decrease of the current.
    Type: Grant
    Filed: October 26, 1992
    Date of Patent: August 16, 1994
    Assignee: Dow Corning Corporation
    Inventors: Udo C. Pernisz, Keith W. Michael
  • Patent number: 5334454
    Abstract: The present invention refers to the deposition of thin film coatings produced by plasma-activated chemical vapor deposition of volatile fluorinated cyclic siloxanes of the structure [RR'SiO].sub.x, in which R is a hydrocarbon radical with 1-6 carbon atoms, R' is a fluorinated hydrocarbon radical with 3-10 carbon atoms, the carbon in the alpha and beta positions with respect to the silicon atom is hydrogenated and x is 3 or 4.
    Type: Grant
    Filed: February 22, 1993
    Date of Patent: August 2, 1994
    Assignee: Dow Corning Corporation
    Inventors: Gerardo Caporiccio, Riccardo D'Agostino, Pietro Favia
  • Patent number: 5320868
    Abstract: Disclosed is a method for forming improved Si--O containing coatings on electronic substrate. The method comprises converting hydrogen silsesquioxane resin into a Si--O containing ceramic coating in the presence of hydrogen gas. The resultant coatings have improved properties such as stable dielectric constants.
    Type: Grant
    Filed: September 13, 1993
    Date of Patent: June 14, 1994
    Assignee: Dow Corning Corporation
    Inventors: David S. Ballance, Keith W. Michael
  • Patent number: 5318857
    Abstract: The present invention relates to a rapid, low-temperature method of forming a ceramic or ceramic-like coating on a substrate. It comprises coating the substrate with a solution comprising a solvent and one or more hydrolyzed or partially hydrolyzed preceramic silicon alkoxides and, optionally, a ceramic oxide precursor. The solvent is evaporated and a preceramic coating thereby deposited on the substrate. The coated substrate is heated to a temperature of between about 40.degree. to about 400.degree. C. in the presence of ozone to ceramify the ceramic or ceramic-like coating. Additional protective coatings may be applied onto the coating thus produced.
    Type: Grant
    Filed: November 6, 1989
    Date of Patent: June 7, 1994
    Assignee: Dow Corning Corporation
    Inventor: Loren A. Haluska
  • Patent number: 5312684
    Abstract: This invention relates to a method of forming a threshold switching device which exhibits negative differential resistance and to the devices formed thereby. The method comprises depositing a silicon dioxide film derived from hydrogen silsesquioxane resin between at least two electrodes and then applying a voltage above a threshold voltage across the electrodes.
    Type: Grant
    Filed: May 2, 1991
    Date of Patent: May 17, 1994
    Assignee: Dow Corning Corporation
    Inventors: Keith W. Michael, Udo C. Pernisz
  • Patent number: 5310583
    Abstract: Silicon and oxygen containing coatings are deposited by the chemical vapor deposition of hydrogen silsesquioxane in an environment comprising nitrous oxide.
    Type: Grant
    Filed: November 2, 1992
    Date of Patent: May 10, 1994
    Assignee: Dow Corning Corporation
    Inventors: Marie N. Eckstein, David S. Ballance
  • Patent number: 5293335
    Abstract: A digital memory circuit for electronic applications. The circuit has at least one memory element connected in series with a load resistor. The digital memory circuit also includes a voltage supply and a data output terminal. The memory element in the digital memory circuit is in the form of a silicon dioxide film derived from a hydrogen silsesquioxane resin. The silicon dioxide film is characterized by a jV curve which includes both resistive and conductive regions for the memory element.
    Type: Grant
    Filed: December 9, 1992
    Date of Patent: March 8, 1994
    Assignee: Dow Corning Corporation
    Inventors: Udo C. Pernisz, Keith W. Michael, Loren A. Haluska
  • Patent number: 5290354
    Abstract: The present invention relates to a method of forming a ceramic or ceramic-like coating on a substrate, especially electronic devices, as well as the substrate coated thereby. The method comprises coating said substrate with a solution comprising a solvent, hydrogen silsesquioxane resin and a modifying ceramic oxide precursor selected from the group consisting of tantalum oxide precursors, niobium oxide precursors, vanadium oxide precursors, phosphorous oxide precursors and boron oxide precursors. The solvent is then evaporated to thereby deposit a preceramic coating on the substrate. The preceramic coating is then ceramified by heating the to a temperature of between about 40.degree. C. and about 1000.degree. C. This coating, moreover, may be covered by additional passivation and barrier coatings.
    Type: Grant
    Filed: August 7, 1990
    Date of Patent: March 1, 1994
    Assignee: Dow Corning Corporation
    Inventor: Loren A. Haluska
  • Patent number: 5283545
    Abstract: This invention relates to a voltage pulse controlled variable resistor in which at least 2 leads are placed in direct contact with a material containing silica derived from hydrogen silsesquioxane. The resistor is formed by depositing a silica film derived from hydrogen silsesquioxane resin between at least two electrodes. The resistance of the component is varied by applying voltage pulses to the leads.
    Type: Grant
    Filed: July 20, 1992
    Date of Patent: February 1, 1994
    Assignee: Dow Corning Corporation
    Inventor: Udo C. Pernisz
  • Patent number: 5283019
    Abstract: The preparation of porous ceramic bodies by sintering certain curable organopolysiloxanes filled with silicon carbide powders. This process is advantageous in that the green bodies have relative high strengths and thus can be easily handled and, if desired, machined before sintering.
    Type: Grant
    Filed: May 4, 1993
    Date of Patent: February 1, 1994
    Assignee: Dow Corning Corporation
    Inventors: William H. Atwell, Chandan K. Saha, Gregg A. Zank
  • Patent number: 5283380
    Abstract: This invention relates to an improved method of preparing the active telogen CF.sub.3 CFClI. The process comprises reacting chlorotrifluoroethylene, iodine, and iodine pentafluoride in the presence of an aluminum bromide catalyst at a temperature above about 25.degree. C.
    Type: Grant
    Filed: June 11, 1993
    Date of Patent: February 1, 1994
    Assignee: Dow Corning Corporation
    Inventors: Bernard Boutevin, Gerald A. Gornowicz
  • Patent number: 5279661
    Abstract: Compositions suitable for depositing coatings containing silicon and oxygen are disclosed. The compositions contain vaporized hydrogen silsesquioxane in a diluent gas.
    Type: Grant
    Filed: April 27, 1992
    Date of Patent: January 18, 1994
    Assignee: Dow Corning Corporation
    Inventor: Theresa E. Gentle
  • Patent number: 5279780
    Abstract: This invention relates to the preparation of polycrystalline silicon carbide fibers from ceramic fibers. The process involves heating the ceramic fiber in an environment containing a volatile sintering aid to a temperature sufficient to convert the ceramic fiber to the polycrystalline silicon carbide fiber.
    Type: Grant
    Filed: July 22, 1992
    Date of Patent: January 18, 1994
    Assignee: Dow Corning Corporation
    Inventors: Jonathan Lipowitz, James A. Rabe