Patents Represented by Attorney Rosaleen P. Morris-Oskanian
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Patent number: 7482676Abstract: Low dielectric materials and films comprising same have been identified for improved performance when used as performance materials, for example, in interlevel dielectrics integrated circuits as well as methods for making same. In one aspect of the present invention, the performance of the dielectric material may be improved by controlling the weight percentage of ethylene oxide groups in the at least one porogen.Type: GrantFiled: July 11, 2006Date of Patent: January 27, 2009Assignee: Air Products and Chemicals, Inc.Inventors: Brian Keith Peterson, John Francis Kirner, Scott Jeffrey Weigel, James Edward MacDougall, Lisa Deis, Thomas Albert Braymer, Keith Douglas Campbell, Martin Devenney, C. Eric Ramberg, Konstantinos Chondroudis, Keith Cendak
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Patent number: 7465833Abstract: The present invention relates to processes for the catalytic hydrogenation of aromatic amines to their acyclic counterparts using a ruthenium catalyst on a lithium aluminate support. The hydrogenation process comprises contacting an aromatic amine with hydrogen in the presence of a ruthenium catalyst under temperature and pressure conditions suitable to effect ring hydrogenation. The process is especially useful for hydrogenating aniline to cyclohexylamine.Type: GrantFiled: September 22, 2005Date of Patent: December 16, 2008Assignee: Air Products and Chemicals, Inc.Inventors: Gamini Ananda Vedage, Hao Ding, Matthew J. Engel, Eugene George Lutz, Lenore Ann Emig
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Patent number: 7452426Abstract: Process solutions comprising one or more surfactants are used to reduce the number of defects in the manufacture of semiconductor devices. In certain preferred embodiments, the process solution of the present invention may reduce defects when employed as a rinse solution either during or after the development of the CMP processing. Also disclosed is a method for reducing the number of defects on a plurality of post-CMP processed substrates employing the process solution of the present invention.Type: GrantFiled: September 12, 2006Date of Patent: November 18, 2008Assignee: Air Products and Chemicals, Inc.Inventors: Peng Zhang, Brenda Faye Ross
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Patent number: 7421885Abstract: A method and apparatus for determining pore size distribution and/or the presence of at least one killer pore in at least a portion of a porous film deposited upon a substrate are disclosed herein. In one embodiment, there is provided a method for determining pore size distribution comprising: providing the substrate having the film deposited thereupon wherein the film comprises pores and wherein the pores have a first volume; exposing the film to an adsorbate at a temperature and a pressure sufficient to provide condensation of the adsorbate in pores and wherein the pores after the exposing step have a second volume; and measuring the difference between the first and the second volume using a volumetric technique; and calculating the pore size and pore volume using the change in the first and the second volume, the pressure, and a model that relates pressure to pore diameter.Type: GrantFiled: June 28, 2005Date of Patent: September 9, 2008Assignee: Air Products and Chemicals, Inc.Inventors: Ronald Joseph Kitzhoffer, Scott Jeffrey Weigel, Charles Gardner Coe, Michael Francis Kimak, James Edward MacDougall, John Francis Kirner
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Patent number: 7416717Abstract: Provided are methods for producing pentahalosulfur peroxides and monoxides, such as bis-(pentafluorosulfur) peroxide, that involve exposing a composition comprising a pentahalosulfur hypohalite, and optionally a sulfur hexahalide or trihalomethyl hypohalite, to a halogen free radical scavenger.Type: GrantFiled: March 20, 2007Date of Patent: August 26, 2008Assignee: Air Products and Chemicals, Inc.Inventor: Robert George Syvret
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Patent number: 7404845Abstract: A mixture and method for the storage and delivery of at least one gas are disclosed herein. In one aspect, there is provided a mixture for the storage and delivery of at least one gas comprising: an ionic liquid comprising an anion and a cation; and at least one gas that is disposed within and is reversibly chemically reacted with the ionic liquid. In another aspect, there is provided a method for delivering at least one gas from a mixture comprising an ionic liquid and at least one gas comprising: reacting the at least one gas and the ionic liquid to provide the mixture and separating the at least one gas from the mixture wherein the at least one gas after the separating step is substantially the same as the at least one gas prior to the reacting step.Type: GrantFiled: September 23, 2004Date of Patent: July 29, 2008Assignee: Air Products and Chemicals, Inc.Inventors: Daniel Joseph Tempel, Philip Bruce Henderson, Jeffrey Richard Brzozowski
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Patent number: 7387738Abstract: The present invention relates to a method for removing metal oxides from a substrate surface. In one particular embodiment, the method comprises: providing a substrate, a first, and a second electrode that reside within a target area; passing a gas mixture comprising a reducing gas through the target area; supplying an amount of energy to the first and/or the second electrode to generate electrons within the target area wherein at least a portion of the electrons attach to a portion of the reducing gas and form a negatively charged reducing gas; and contacting the substrate with the negatively charged reducing gas to reduce the metal oxides on the surface of the substrate.Type: GrantFiled: April 28, 2003Date of Patent: June 17, 2008Assignee: Air Products and Chemicals, Inc.Inventors: Chun Christine Dong, Wayne Thomas McDermott, Alexander Schwarz, Gregory Khosrov Arslanian, Richard E. Patrick
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Patent number: 7361631Abstract: A composition and method using same for removing photoresist and/or processing residue from a substrate are described herein. In one aspect, there is provided a composition for removing residue consisting essentially of: an acidic buffer solution having an acid selected from a carboxylic acid or a polybasic acid and an ammonium salt of the acid in a molar ratio of acid to ammonium salt ranging from 10:1 to 1:10; an organic polar solvent that is miscible in all proportions in water; a fluoride, and water wherein the composition has a pH ranging from about 3 to about 7.Type: GrantFiled: September 15, 2004Date of Patent: April 22, 2008Assignee: Air Products and Chemicals, Inc.Inventors: Matthew I. Egbe, Jennifer M. Rieker, Darryl W. Peters, Irl E. Ward
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Patent number: 7361316Abstract: A system for the purification and recycle of impure argon is disclosed herein. The system of the present invention can produce very high purity argon, i.e., about 1 ppb or less of impurities. In one embodiment, a cryogenic separation apparatus is used to remove the nitrogen, hydrocarbon, and hydrogen impurities from the argon stream. A catalyst bed is then operated at ambient temperature to remove hydrogen, oxygen, and carbon monoxide impurities to provide the purified argon product.Type: GrantFiled: August 24, 2004Date of Patent: April 22, 2008Assignee: Air Products and Chemicals, Inc.Inventor: Madhukar Bhaskara Rao
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Patent number: 7357138Abstract: A process for the removal of a substance from a substrate for etching and/or cleaning applications is disclosed herein. In one embodiment, there is provided a process for removing a substance having a dielectric constant greater than silicon dioxide from a substrate by reacting the substance with a reactive agent that comprises at least one member from the group consisting a halogen-containing compound, a boron-containing compound, a hydrogen-containing compound, nitrogen-containing compound, a chelating compound, a carbon-containing compound, a chlorosilane, a hydrochlorosilane, or an organochlorosilane to form a volatile product and removing the volatile product from the substrate to thereby remove the substance from the substrate.Type: GrantFiled: November 26, 2003Date of Patent: April 15, 2008Assignee: Air Products and Chemicals, Inc.Inventors: Bing Ji, Stephen Andrew Motika, Ronald Martin Pearlstein, Eugene Joseph Karwacki, Jr., Dingjun Wu
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Patent number: 7307343Abstract: Low dielectric materials and films comprising same have been identified for improved performance when used as interlevel dielectrics in integrated circuits as well as methods for making same. These materials are characterized as having a dielectric constant (?) a dielectric constant of about 3.7 or less; a normalized wall elastic modulus (E0?), derived in part from the dielectric constant of the material, of about 15 GPa or greater; and a metal impurity level of about 500 ppm or less. Low dielectric materials are also disclosed having a dielectric constant of less than about 1.95 and a normalized wall elastic modulus (E0?), derived in part from the dielectric constant of the material, of greater than about 26 GPa.Type: GrantFiled: May 30, 2002Date of Patent: December 11, 2007Assignee: Air Products and Chemicals, Inc.Inventors: John Francis Kirner, James Edward MacDougall, Brian Keith Peterson, Scott Jeffrey Weigel, Thomas Alan Deis, Martin Devenney, C. Eric Ramberg, Konstantinos Chondroudis, Keith Cendak
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Patent number: 7294585Abstract: Low dielectric materials and films comprising same have been identified for improved performance when used as performance materials, for example, in interlevel dielectrics integrated circuits as well as methods for making same. In one aspect of the present invention, the performance of the dielectric material may be improved by controlling the weight percentage of ethylene oxide groups in the at least one porogen.Type: GrantFiled: July 11, 2006Date of Patent: November 13, 2007Assignee: Air Products and Chemicals, Inc.Inventors: Brian Keith Peterson, John Francis Kirner, Scott Jeffrey Weigel, James Edward MacDougall, Lisa Deis, legal representative, Thomas Albert Braymer, Keith Douglas Campbell, Martin Devenney, C. Eric Ramberg, Konstantinos Chondroudis, Keith Cendak, Thomas Alan Deis, deceased
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Patent number: 7272453Abstract: The work memory of a programmable logic controller (PLC) is loaded with only one instruction at a time from the PLC's load memory which contains the entire instruction set to control a process. Each instruction has a format which contains at least one option code which must be evaluated to be true by the PLC interpreter before the corresponding instruction can be executed. If the interpreter evaluates the at least one option code to be false, the instruction is not executed and the next instruction is transferred from the load memory to the work memory and its corresponding option codes are then evaluated.Type: GrantFiled: November 30, 2004Date of Patent: September 18, 2007Assignee: Air Products and Chemicals, Inc.Inventors: William John Dax, Jeffery Van Bauer
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Patent number: 7267842Abstract: A process for the selective removal of a TiO2-containing substance from an article for cleaning applications is disclosed herein. In one embodiment, there is provided a process for removing a TiO2-containing substance from an article comprising: providing the article having the TiO2-containing substance deposited thereupon; reacting the substance with a reactive gas comprising at least one selected from a fluorine-containing cleaning agent, a chlorine-containing cleaning agent and mixtures thereof to form a volatile product; and removing the volatile product from the article to thereby remove the substance from the article.Type: GrantFiled: March 15, 2004Date of Patent: September 11, 2007Assignee: Air Products and Chemicals, Inc.Inventors: Dingjun Wu, Bing Ji, Philip Bruce Henderson, Eugene Joseph Karwacki, Jr.
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Patent number: 7261118Abstract: Vessel and method for the production and delivery of a precursor-containing fluid stream comprising the gaseous phase of a precursor material are disclosed herein. In one aspect, there is provided an vessel comprising: an interior volume wherein the interior volume is segmented into an upper volume and a lower volume wherein the upper volume and the lower volume are in fluid communication; a lid comprising a fluid inlet, a fluid outlet, an optional fill port, and an internal recess wherein at least a portion of the upper volume resides within the internal recess; a sidewall interposed between the lid and a base; and at least one protrusion that extends into the lower volume wherein the precursor is in contact with the at least one protrusion and wherein at least one protrusion extends from at least one selected from the lid, the sidewall, the base, and combinations thereof.Type: GrantFiled: August 2, 2004Date of Patent: August 28, 2007Assignee: Air Products and Chemicals, Inc.Inventors: Charles Michael Birtcher, Richard J. Dunning, Robert Daniel Clark, Arthur Kenneth Hochberg, Thomas Andrew Steidl
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Patent number: 7211553Abstract: A dense cleaning fluid for removing contaminants from a substrate and a method comprising same is disclosed herein. In one embodiment of the present invention, the dense cleaning fluid comprises a dense fluid and at least one acetylenic diol or acetylenic alcohol surfactant.Type: GrantFiled: December 16, 2003Date of Patent: May 1, 2007Assignee: Air Products and Chemicals, Inc.Inventors: Hoshang Subawalla, Gene Everad Parris, Madhukar Bhaskara Rao, Christine Peck Kretz
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Patent number: 7208049Abstract: Process solutions comprising one or more surfactants are used to reduce the number of defects in the manufacture of semiconductor devices. In certain preferred embodiments, the process solution of the present invention may reduce defects when employed as a rinse solution either during or after the development of the CMP processing. Also disclosed is a method for reducing the number of defects on a plurality of post-CMP processed substrates employing the process solution of the present invention.Type: GrantFiled: October 20, 2003Date of Patent: April 24, 2007Assignee: Air Products and Chemicals, Inc.Inventors: Peng Zhang, Brenda Faye Ross
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Patent number: 7205422Abstract: Metal ketoiminate or diiminate complexes, containing copper, silver, gold, cobalt, ruthenium, rhodium, platinum, palladium, nickel, osmium, or indium, and methods for making and using same are described herein. In certain embodiments, the metal complexes described herein may be used as precursors to deposit metal and metal-containing films on a substrate through, for example, atomic layer deposition or chemical vapor deposition conditions.Type: GrantFiled: April 21, 2005Date of Patent: April 17, 2007Assignee: Air Products and Chemicals, Inc.Inventor: John Anthony Thomas Norman
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Patent number: 7195676Abstract: Method for removing flux residue and defluxing residue from an article using a dense processing fluid and a dense rinse fluid is disclosed herein. In one embodiment, there is provided a method comprising: introducing the article comprising contaminants into a processing chamber; contacting the article with a dense processing fluid comprising a dense fluid, at least one processing agent, and optionally a cosolvent to provide a partially treated article; and contacting the partially treated article with a dense rinse fluid comprising the dense fluid and optionally the cosolvent to provide a treated article wherein an agitation source is introducing during at least a portion of the first and/or the second contacting step.Type: GrantFiled: July 13, 2004Date of Patent: March 27, 2007Assignee: Air Products and Chemicals, Inc.Inventors: Wayne Thomas McDermott, Gene Everad Parris, Dean Van-John Roth, Hoshang Subawalla
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Patent number: 7129199Abstract: Process solutions comprising one or more surfactants are used to reduce the number of defects in the manufacture of semiconductor devices. In certain preferred embodiments, the process solution of the present invention may reduce post-development defects such as pattern collapse when employed as a rinse solution either during or after the development of the patterned photoresist layer. Also disclosed is a method for reducing the number of pattern collapse defects on a plurality of photoresist coated substrates employing the process solution of the present invention.Type: GrantFiled: July 10, 2003Date of Patent: October 31, 2006Assignee: Air Products and Chemicals, Inc.Inventors: Peng Zhang, Danielle Megan King Curzi, Eugene Joseph Karwacki, Jr., Leslie Cox Barber