Abstract: A machine vision system for inspection of a mark (such as a multi-character mark) on an IC device as shown. The system provides search and defect analysis for the mark, individual characters of the mark, and the foreground and the background of the mark. The system provides for search and defect analysis reports thereof. It includes components for operator training search and defect analysis models for the whole mark, and for automatic training of such models for individual characters of the mark.