Patents Represented by Attorney S. Matthew Cairn

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  • Photoresist compositions and methods and articles of manufacture comprising same
    Patent number: 6048672
    Abstract: The invention includes use of a positive chemically amplified photoresist composition that produces a strong photogenerated acid. The resist is coated onto a metal substrate that has been subjected to a stringent bake step, e.g. heating of the substrate at about at least 140.degree. C. for more than 60 seconds. The combined use of strong photogenerated acid and stringent pre-coating substrate bake provides highly resolved resist relief images, including on metal substrates.
    Type: Grant
    Filed: February 20, 1998
    Date of Patent: April 11, 2000
    Assignee: Shipley Company, L.L.C.
    Inventors: James F. Cameron, Martha M. Rajaratnam, Roger F. Sinta, James W. Thackeray