Patents Represented by Attorney Sangya Jain

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  • Method for removing photoresist composition from substrate surfaces
    Patent number: 5637436
    Abstract: Ternary mixtures of C.sub.4 to C.sub.8 alkyl acetate, C.sub.4 to C.sub.8 alkyl alcohol, and water, formulated to have a flash point of above 100.degree. F., are disclosed, particularly for use in edge residue removal processes in the fabrication of integrated circuits and like products.
    Type: Grant
    Filed: April 4, 1995
    Date of Patent: June 10, 1997
    Assignee: Hoechst Celanese Corporation
    Inventor: Donald W. Johnson