Patents Represented by Attorney Scheinberg & Associates

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  • Dual beam system
    Patent number: 8183547
    Abstract: A dual beam system provides for operation of a focused ion beam in the presence of a magnetic field from an ultra-high resolution electron lens. The ion beam is deflected to compensate for the presence of the magnetic field.
    Type: Grant
    Filed: May 27, 2010
    Date of Patent: May 22, 2012
    Assignee: FEI Company
    Inventor: Tom Miller