Patents Represented by Attorney Schemiser, Olsen & Watts

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  • Adaptive inspection method and system
    Patent number: 5978501
    Abstract: A method and system for detecting defects in the design of a photolithographic mask or a printed wafer. It derives an adaptive inspection algorithm that allows for a tighter inspection of a mask to a data set which has repeatable differences. The inspection should allow flexibility to remove un-important differences while maintaining a tight inspection capability.
    Type: Grant
    Filed: January 3, 1997
    Date of Patent: November 2, 1999
    Assignee: International Business Machines Corporation
    Inventors: Karen Marie Dusablon Badger, Brian Joseph Grenon, David Shawn O'Grady, Jacek Grzegorz Smolinski