Abstract: A multiple function, modular vacuum cleaning system is described having a vacuum head which is releasably mounted on a waste recovery tank to form a first, portable wet/dry vacuum cleaning machine. The wet/dry vacuum cleaning machine in turn can be mounted on a cleaning solution tank to provide a second portable machine having wet extraction as well as wet and dry vacuum capabilities.
Abstract: A high pressure, high throughput, single wafer, semiconductor processing reactor is disclosed which is capable of thermal CVD, plasma-enhanced CVD, plasma-assisted etchback, plasma self-cleaning, and deposition topography modification by sputtering, either separately or as part of in-situ multiple step processing. A low temperature CVD process for forming a highly conformal layer of silicon dioxide is also disclosed. The process uses very high chamber pressure and low temperature, and TEOS and ozone reactants. The low temperature CVD silicon dioxide deposition step is particularly useful for planarizing underlying stepped dielectric layers, either along or in conjunction with a subsequent isotropic etch.
Type:
Grant
Filed:
October 26, 1988
Date of Patent:
October 10, 1989
Assignee:
Applied Materials, Inc.
Inventors:
David N. Wang, John M. White, Kam S. Law, Cissy Leung, Salvador P. Umotoy, Kenneth S. Collins, John A. Adamik, Ilya Perlov, Dan Maydan
Abstract: A bicycle toe clip is disclosed having double strap carriers corresponding to the upper of a bike shoe for holding an associated shoe strap in a generally rectangular wide-mouth configuration to permit quick foot entry and exit.