Abstract: A holder for securing eyeglasses, sunglasses or other personal items that may be securely incorporated into an article of clothing at the time the article is manufactured. The holder includes a base member that can be inserted into an article of clothing. The base member can be securely attached to an interconnecting cord. The cord may have one end threaded through the article of clothing and securely affixed to the base member and the other end securely affixed to the external part of the holder. The external part of the holder can include a hanger with a support base and a loop. The holder allows a wearer to insert a temple piece of a pair of eyeglasses, or a hook attached to another personal item, through the loop and allows the item to assume a secure and relatively flat position against the wearer's body. The holder may also in include an RFID tag. The holder may also include a covered loop. The covering may be either internal or external. The covering may include a design, logo or monogram.

Abstract: A chuck apparatus for holding a substrate is the disclosed. The chuck apparatus includes a first surface portion on which the substrate is to be held and a second surface portion adjacent to the first surface portion and extending at least partially around an edge of the first surface portion and which, in use, is arranged to deflect gas over the first surface portion and thus the substrate that is to be held on the first surface portion.

Abstract: A knife package includes a card having a front side and a back side. The knife package further comprises a utility knife having a body and a plurality of blade holders movable within the body, and a plurality of slides on the body. Each slide is operatively connected with one of the blade holders, and the slides are arranged to move associated blade holders in the body. The knife package further comprises a securement structure that secures the utility knife to the card, wherein said utility knife is secured on the front side of said card by the securement structure such that the plurality of slides of the utility knife are visible when viewing the front side of the card from an angle normal to the front side of the card.

Abstract: Processes and apparatus are described that form a solar cell absorber on a surface of a workpiece by reacting a precursor layer disposed on the surface of the workpiece with an absorber constituent vapor in a heating chamber. The absorber constituent material is delivered from an absorber constituent material delivery system in molten form into a container in the heating chamber and vaporized to be used during the reaction.

Abstract: A method and a system are provided for forming planar absorber layers or structures by planarizing and reacting precursor layers in a reactor. A precursor structure is first formed over the front surface of a foil substrate and then planarized through application of pressure by a smooth surface while heated to a first temperature range to obtain a planar layer. The planar layer may be only partially reacted. The planar layer is further reacted at a second temperature range to form a fully or completely reacted planar absorber layer. The planar absorber layer may include at least one Group IB material, at least one Group IIIA material and at least one Group VIA material. The planar absorber layer may be a Group IBIIIAVIA compound layer.

Abstract: A utility knife blade comprises a cutting edge portion and a remaining portion. The remaining portion is tempered martensite and has a first hardness. The cutting edge portion comprises a region that has been locally re-heat treated so that the microstructure in the cutting edge portion is untempered martensite having a hardness greater than the first hardness.

Abstract: The embodiments of the present invention provide a defect detection process and apparatus to detect defects in solar cell structures. During the process, an input signal from a signal source is applied to a top surface of a transparent conductive layer of a solar cell structure. In response to the input signal, an output signal is generated from a predetermined area of the top surface and detected by a defect detector. The output signal carrying the defect position information is transmitted to a computer and registered in a database. With the position information, an injector is driven to the defect location to apply an insulator to passivate the defect. A finger pattern layer may be formed over the predetermined area after completing the defect detection and passivation processes.

Abstract: A method for monitoring a user in a user living area in a system including a system controller having control parameters for controlling the operations of said system and a remote monitoring site, comprising; monitoring a user activity of said user; activating a control circuit in response to an occurrence of said user activity to provide user activity information to said system controller representative of said user activity; performing a statistical operation upon said user activity information to provide a statistical determination; and adjusting at least one of said control parameters in accordance with said statistical determination.

Abstract: A method for identifying process window signature patterns in a device area of a mask is disclosed. The signature patterns collectively provide a unique response to changes in a set of process condition parameters to the lithography process. The signature patterns enable monitoring of associated process condition parameters for signs of process drift, analyzing of the process condition parameters to determine which are limiting and affecting the chip yields, analyzing the changes in the process condition parameters to determine the corrections that should be fed back into the lithography process or forwarded to an etch process, identifying specific masks that do not transfer the intended pattern to wafers as intended, and identifying groups of masks that share common characteristics and behave in a similar manner with respect to changes in process condition parameters when transferring the pattern to the wafer.

Abstract: The present inventions relate to methods and apparatus for detecting and mechanically removing defects and a surrounding portion of the photovoltaic layer and the substrate in a thin film solar cell such as a Group IBIIIAVIA compound thin film solar cell to improve its efficiency.

Abstract: In immersion lithography after exposure of a substrate is complete, a detector is used to detect any residual liquid remaining on the substrate and/or substrate table.

Abstract: A radiation source is configured to generate extreme ultraviolet radiation. The radiation source includes a laser constructed and arranged to generate a beam of radiation directed to a plasma generation site where a plasma is generated when the beam of radiation interacts with a fuel, an optical component having a surface that is arranged and positioned to be hit by a droplet of fuel, and a temperature conditioner constructed and arranged to elevate the temperature of the surface.

Abstract: According to one embodiment, a video display device has a connection unit configured to connect to a plurality of external instruments via a network, a receiving unit configured to receive, from the plurality of external instrument connected to the video display device via the connection unit, standard compatibility information indicating that the external instrument meets the mutual controllability standards, a display unit configured to display video information output by one of the plurality of external instruments and a selection unit configured to select one of the plurality of external instruments, corresponded to information based on the standard compatibility information, connected to the connection unit as an output source of video information to be displayed on the display unit.

Abstract: A computer-implemented method for performing color registration on template media having template markings thereon.

Abstract: The invention relates to a marker structure for optical alignment of a substrate and provided thereon. The marker structure has a first reflecting surface at a first level and a second reflecting surface at a second level. A separation between the first level and the second level determines a phase depth condition. The marker structure further has an additional structure. The additional structure is arranged to modify the separation during manufacture of the marker structure. The invention further relates to a method of forming such a marker structure.

Abstract: A method for cleaning elements of a lithographic apparatus, for example optical elements such as a collector mirror, includes providing a gas containing nitrogen; generating nitrogen radicals from at least part of the gas, thereby forming a radical containing gas; and providing at least part of the radical containing gas to the one or more elements of the apparatus. A lithographic apparatus includes a source and an optical element, and an electrical discharge generator arranged to generate a radio frequency discharge.

Abstract: A process for integrated utilization of the energy and material contents of hydrolysates and solids obtained in the enzymatic hydrolysis of renewable raw materials, in which the resulting hydrolysis solution is used as a carbon source in fermentations and the unhydrolysed solids are sent to biogas production.

Abstract: An electronic watermarking embedding-processing section acquires layout information which specifies an embedding area of first sub information and an embedding area of second sub information in main image information. The electronic watermarking embedding-processing section performs overlapping processing for invisibly embedding the first sub information in the embedding area of the first sub information in the main image information which is specified by the layout information. The electronic watermarking embedding-processing section performs overlapping processing for invisibly embedding the second sub information in the embedding area of the second sub information in the main image information which is specified by the layout information.

Abstract: Memory reallocation and sharing among components of an electronic system is provided. The electronic system includes a first memory area coupled for access by a first processor via a first bus, and a second memory area coupled for access by a second processor via a second bus. An example system includes a central processor as the first processor and a digital signal processor as the second processor. The electronic system further includes memory configurations that support shared access of the second memory area by the first processor. Using shared access, the first processor can directly access the second memory via the first bus or indirectly access the second memory via the second bus and the second processor. The memory sharing also includes partitioning the shared memory to simultaneously provide the first processor with direct and indirect access to the shared memory.

Abstract: A method of determining a position of a substrate relative to an imprint template is described, wherein the imprint template has at least three gratings and the substrate has at least three gratings positioned such that each imprint template grating forms a composite grating with an associated substrate grating, the at least three imprint template gratings and associated substrate gratings having offsets relative to one another. The method includes detecting an intensity of radiation which is reflected by the three composite gratings, and using the detected intensities to determine displacement of the substrate or imprint template from a position.