Abstract: Compositions containing an organic pigment coated with metal oxides, wherein the pigment particles are provided with a tenacious, dense, highly crosslinked coating of silica and/or alumina which is fixed by polycondensation of a silicate and/or aluminate with the free hydroxyl groups of a layer that densely coats the surface of the pigment particles and which consists substantially of partially hydrolyzed compounds of elements of group 4A or 4B of the Periodic Table selected from the group consisting of chelates of formula ##STR1## wherein R is methyl, ethyl, methoxy or ethoxy, R.sup.1 is methyl or ethyl and X is halogen or C.sub.1 -C.sub.4 alkoxy, and M is Ti or Sn, and of esters of formulaQ(OR.sup.2).sub.4 (III),wherein Q is an element of group 4A or 4B of the Periodic Table and R.sup.2 is C.sub.1 -C.sub.4 alkyl.

Abstract: Compounds of the formula (I) ##STR1## in which the Rs independently of one another are H, phenyl, naphthyl or C.sub.7 -C.sub.30 alkaryl and R.sup.1 is H, C.sub.1 -C.sub.8 alkyl, C.sub.7 -C.sub.9 aralkyl, C.sub.5 -C.sub.12 cycloalkyl, phenyl, naphthyl, C.sub.7 -C.sub.30 alkaryl or a group of the formula (II)--(CH.sub.2).sub.a --SR.sup.3 (II)R.sup.2 is C.sub.7 -C.sub.30 alkaryl, phenyl, naphthyl or phenyl containing, in the para-position, an HO or C.sub.1 -C.sub.18 alkoxy group or a group of the formulae ##STR2## or R.sup.1 and R.sup.2, together with the nitrogen atom to which they are attached, are a radical of the formula (III) ##STR3## R.sup.3 is a radical of the formulae --(CH.sub.2).sub.b --COOR.sup.6 or --(CH.sub.2).sub.2 OCOR.sup.7, a is the number 1, 2 or 3 and b is the number 1 or 2, and R.sup.4 is phenyl or a group of the formula (II), the two R.sup.5 s independently of one another are H, C.sub.1 -C.sub.24 alkyl, C.sub.5 -C.sub.12 cycloalkyl or C.sub.7 -C.sub.9 aralkyl, and R.sup.6 is H, C.sub.1 -C.

Abstract: Compositions containing a lubricant, a hydraulic fluid or a metal-working fluid and at least one compound of the formula I ##STR1## in which R, R.sup.4, R.sup.5 and n are as defined in claim 1, are described. The compounds of the formula I are suitable for use as anti-wear agents and as extreme-pressure additives for lubricants, hydraulic fluids and metal-working fluids. Novel compounds of the formula I are also described.

Abstract: The invention relates to polycycloacetals of formula I ##STR1## wherein n is an integer from 1 to 500, x and y are each independently of the other 0 or 1, R.sup.1 is a carbon atom or a tetravalent hydrocarbon radical having a molecular weight not greater than 1000 and which can additionally contain ether oxygen atoms or oxygen atoms in hydroxyl, carbonyl or epoxy groups, and R.sup.2 is a tetravalent hydrocarbon radical derived from a dialdehyde or a diketone.The polycycloacetals can be used together with conventional hardeners and/or curing catalysts for epoxy resins for the fabrication of cross-linked (cured) products having good properties, especially having excellent fastness to solvents, light and weathering.

Abstract: Polymers consisting of (a) vinyl compounds having a 2,2'-bipyridyl side group, (b) vinyl compounds having a radiation-sensitive side group and, if appropriate, (c) olefines which differ from (a) and (b), and their complexes with metal compounds, with the exception of alkali metal and alkaline earth metal compounds. They are suitable for coating substrates and for the preparation of photographic relief images. Complexes with cobalt salts are effective catalysts for the polymerization of acetylene.

Abstract: Anthraquinones of formula I ##STR1## wherein X is the group --CR.sup.2 R.sup.3 --, where R.sup.2 is H, --CN or C.sub.1 -C.sub.5 -alkyl and R.sup.3 is H or --CN, R.sup.1 is H or C.sub.1 -C.sub.5 -alkyl and R is a direct bond or linear or branched C.sub.1 -C.sub.18 -alkylene which, alone or together with the --CR.sup.2 R.sup.3 -- group, can be interrupted by one or more --O-- when R.sup.2 and/or R.sup.3 are not --CN, and curable compositions comprising (a) an epoxy resin, (b) a hardener if necessary, (c) an anthraquinone of formula I and (d) an amino alcohol. The cured compositions are photosensitive and are suitable for the preparation of coatings and metallic images by electroless metal deposition.

Abstract: The present invention relates to hardenable mixtures containing:(i) a polyglycidyl ether or ester based on an aliphatic, cycloaliphatic or aromatic alcohol or a corresponding carboxylic acid and(ii) a hardener obtainable by reaction of:(A) a mixture of 2-4 mol of a monohydric, aliphatic alcohol and 1 mol of phosphorus pentoxide in an inert organic solvent, or of 2 mol of a dialkyl phosphate or of 2 mol of phosphoric acid, if appropriate in combination with 1-2 mol of a monohydric, aliphatic alcohol, with(B) 0.5-1.5 mol of a diglycidyl ether based on a cycloaliphatic or aromatic diol,with the proviso that the said diglycidyl ether used for the preparation of the hardener has an average molecular weight (number-average) of not more than 2,500 and the said hardener is essentially free from 1,2-epoxide groups.The hardenably mixtures are suitable in particular for the production of coatings.

Abstract: Chlorine-containing polymer containing (a) at least one compound of the formula I ##STR1## in which R.sup.1 is hydrogen, C.sub.1 -C.sub.4 -alkyl, C.sub.5 -C.sub.6 -cycloalkyl, phenyl or phenyl which is substituted by C.sub.1 -C.sub.4 -alkyl or halogen, n is 1 or 2 and, if n is 1, R is C.sub.1 -C.sub.20 -alkyl, C.sub.1 -C.sub.20 -alkyl which is substituted by --OH or --SH, C.sub.2 -C.sub.20 -alkyl which is interrupted by ##STR2## phenyl, phenyl which is substituted by C.sub.1 -C.sub.4 -alkyl, benzyl, benzyl which is substituted by C.sub.1 -C.sub.4 -alkyl, C.sub.5 -C.sub.6 -cycloalkyl or --NR.sup.2 R.sup.3 in which R.sup.2 and R.sup.3 are identical or different and are as defined for R.sup.1, and, if n is 2, R is a direct bond, C.sub.1 -C.sub.10 -alkylene, C.sub.1 -C.sub.10 -alkylene which is substituted by phenyl, benzyl, --OH, C.sub.1 14 C.sub.4 -alkoxy, C.sub.1 -C.sub.20 -acyloxy, phenylsulfonyl or C.sub.1 -C.sub.4 -alkylsulfonyl or C.sub.2 -C.sub.10 -alkylene which is interrupted by ##STR3## in which R.sup.

Abstract: Photosensitive compositions of matter which are capable of undergoing condensation or addition reactions and may or may not be crosslinkable, and which contain an anthraquinone of the formula I ##STR1## in which X, X', R' and R" are as defined in Patent Claim 1 and X or X' is, for example, --OH or --NH.sub.2, at least one monomeric, oligomeric or polymeric compound which can be reacted with this antraquinone, for example, if X is --OH, a polymer with terminal glycidyl groups, and, where relevant, a crosslinking agent and/or a salt of a metal of group Ib or VIII of the periodic table, are suitable for image formation by means of electroless metal deposition.

Abstract: An anode for aqueous electrolyses, consisting of a frame or support and a porous substrate which is connected to the frame and in which electrochemically active substances are dispersed. The substrate consists of titanium which is doped with chromium or nickel.

Abstract: Compounds containing at least 5 mol % of structural units of the formulae I and/or II ##STR1## in which Q is an unsubstituted or substituted tetravalent aromatic radical to which in each case two carbonyl groups are bonded in the ortho- or peri-position, R.sup.1 is selected from the radicals of the formulae III, IV and V ##STR2## R.sup.2, R.sup.3, R.sup.4 and R.sup.5 are hydrogen, alkyl, cycloalkyl or substituted or unsubstituted aryl or aralkyl, R.sup.6 and R.sup.7 are aryl or halogen, m and n are 0, 1 or 2 and o is 0, 1, 2, 3 or 4, are described.The compounds are distinguished by an increased resistance to oxidation by heat. They can be used to produce coatings and relief structures.

Abstract: The invention relates to complexes of formula I ##STR1## wherein R.sup.1 is fluorine and R.sup.2 is hydrogen, or R.sup.2 is fluorine and R.sup.1 is hydrogen, and Y is bromine, or Y is also chlorine if R.sup.1 is hydrogen. These complexes are organic compounds which exhibit high electrical conductivity.

Abstract: Benzoin esters of aromatic sulfonic acids can be obtained in high yield from benzoin and the respective sulfonyl halide in molar amounts of a base by carrying out the reaction at low temperature in an organic solvent with the addition of water. Aqueous NaOh or KOH can be used as base in this process.