Patents Represented by Attorney, Agent or Law Firm Steve B. Kelber
  • Radiation-sensitive resin composition
    Patent number: 6692887
    Abstract: A radiation-sensitive resin composition including (A) a resin containing an alicyclic skeleton in its backbone, and (B) a radiation-sensitive acid-generating agent, is provided. This composition is excellent in transparency with respect to radiation and dry etching resistance, and can give a photoresist pattern excellent in adhesion to substrates, sensitivity, resolution, and developability.
    Type: Grant
    Filed: November 23, 1998
    Date of Patent: February 17, 2004
    Assignee: JSR Corporation
    Inventors: Mitsuhito Suwa, Toru Kajita, Shin-ichiro Iwanaga, Toshiyuki Ota