Patents Represented by Attorney Thomas A. Berk

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  • Multilayered resist systems using tuned polymer films as underlayers and methods of fabrication thereof
    Patent number: 7361444
    Abstract: Disclosed are multilayered resist structures including bilayer and top surface imaging which utilize tuned underlayers functioning as ARCs, planarizing layers, and etch resistant hard masks whose properties such as optical, chemical and physical properties are tailored to give a multilayer resist structure exhibiting high resolution, residue free lithography and methods of preparing these materials.
    Type: Grant
    Filed: February 23, 1999
    Date of Patent: April 22, 2008
    Assignee: International Business Machines Corporation
    Inventors: Marie Angelopoulos, Katherina E. Babich, Douglas Charles LaTulipe, Qinghuang Lin, David R. Medeiros, Wayne Martin Moreau, Karen E. Petrillo, John P. Simons