Patents Represented by Attorney Thomas E. Ombolt

Find this attorney in the Justia Lawyer Directory

  • Polishing composition and method for high silicon nitride to silicon oxide removal rate ratios
    Patent number: 7846842
    Abstract: The invention provides a chemical-mechanical polishing composition comprising a cationic abrasive, a cationic polymer, a carboxylic acid, and water. The invention further provides a method of chemically-mechanically polishing a substrate with the aforementioned polishing composition. The polishing composition exhibits selectivity for removal of silicon nitride over removal of silicon oxide.
    Type: Grant
    Filed: February 2, 2009
    Date of Patent: December 7, 2010
    Assignee: Cabot Microelectronics Corporation
    Inventors: Phillip W. Carter, Timothy Johns