Patents Represented by Attorney Thomas F. Omholt

Find this attorney in the Justia Lawyer Directory

  • Tantalum CMP compositions and methods
    Patent number: 7998228
    Abstract: A composition suitable for tantalum chemical-mechanical polishing (CMP) comprises about 0.1 to about 10 percent by weight of a zirconia or fumed alumina abrasive, about 0.1 to about 10 percent by weight of an alkali metal iodate salt and an aqueous carrier. The composition has a pH of at least about 10. The composition is utilized to polish a surface of a tantalum-containing substrate.
    Type: Grant
    Filed: July 19, 2006
    Date of Patent: August 16, 2011
    Assignee: Cabot Microelectronics Corporation
    Inventor: Shoutian Li