Patents Represented by Attorney, Agent or Law Firm Thomason Moser & Patterson LLP
  • Patent number: 6416647
    Abstract: The invention provides an electro-chemical deposition cell for face-up processing of semiconductor substrates comprising a substrate support member, a cathode connected to the substrate plating surface, an anode disposed above the substrate support member and an electroplating solution inlet supplying an electroplating solution fluidly connecting the anode and the substrate plating surface. Preferably, the anode comprises a consumable metal source disposed in a liquid permeable structure, and the anode and a cavity ring define a cavity for holding and distributing the electroplating solution to the substrate plating surface. Preferably, the substrate support member comprises a vacuum chuck having vacuum ports disposed on the substrate supporting surface that serves to provide suction during processing and to provide a blow-off gas flow to prevent backside contamination during substrate transfers.
    Type: Grant
    Filed: April 19, 1999
    Date of Patent: July 9, 2002
    Assignee: Applied Materials, Inc.
    Inventors: Yezdi Dordi, Joe Stevens, Roy Edwards, Bob Lowrance, Michael Sugarman, Mark Denome
  • Patent number: 6409896
    Abstract: A method and apparatus for detecting the presence of a plasma. The apparatus comprises an electrically floating contact member that is exposed to a plasma forming region, for example, a semiconductor wafer processing chamber. The floating contact is coupled to a measuring device. When a plasma is present in the plasma forming region, the plasma induces a voltage upon the floating contact which is detected by the measuring device.
    Type: Grant
    Filed: December 1, 1999
    Date of Patent: June 25, 2002
    Assignee: Applied Materials, Inc.
    Inventor: Steve Crocker
  • Patent number: 6395157
    Abstract: A method and apparatus for conditioning a surface of a ceramic body in a process chamber when the process chamber has a vacuum pump, an anode and a cathode. The conditioning method consists of pumping the process chamber down to a vacuum with the vacuum pump, introducing a gas into the chamber, energizing the anode and cathode with RF power to ignite the gas into a plasma, sputter etchinq the surface with ions from the plasma to remove contaminants therefrom. The method is accomplished either within a process chamber to condition, in situ, a ceramic chuck or within a cleaning chamber to condition any form of ceramic body or component.
    Type: Grant
    Filed: September 23, 1998
    Date of Patent: May 28, 2002
    Assignee: Applied Materials, Inc.
    Inventors: Nitin Khurana, Vince Burkhart, Steve Sansoni, Vijay Parkhe, Eugene Tzou
  • Patent number: 6316853
    Abstract: A novel spindle motor assembly is disclosed that utilizes a fixed shaft and places the motor rotor components on the outside wall of the spindle hub directly below its disc stack supporting flange. The structure disclosed provides a compact yet powerful motor having a relatively low profile.
    Type: Grant
    Filed: October 24, 1996
    Date of Patent: November 13, 2001
    Assignee: Seagate Technology LLC
    Inventor: Donald James MacLeod
  • Patent number: 6312568
    Abstract: The present invention provides a method of forming an aluminum nitride layer on a substrate in a processing chamber comprising depositing a first aluminum nitride layer at a first chamber pressure on a substrate, and then depositing a second aluminum nitride layer at a second chamber pressure higher than the first chamber pressure on the aluminum nitride nucleating layer. The first aluminum nitride layer is deposited by sputtering an aluminum target in a nitrogen and inert gas plasma in a processing chamber at a chamber pressure of about 1.5 to about 3 milliTorr. The second aluminum nitride layer is deposited by sputtering an aluminum target in a nitrogen and inert gas plasma at a chamber pressure of about 5 to about 10 milliTorr. The process may be carried out in the same physical vapor deposition chamber with the substrate being maintained at a temperature of preferably between about 125° C. and about 500° C.
    Type: Grant
    Filed: December 7, 1999
    Date of Patent: November 6, 2001
    Assignee: Applied Materials, Inc.
    Inventors: Ingo Wilke, Rochelle King, Hoa Kieu
  • Patent number: 6314573
    Abstract: A method and apparatus for providing subscription-on-demand (SOD) services for a interactive information distribution system, where a consumer may subscribe to packages of on-demand programs for a single price and view the programs in the subscribed package at any time for no additional cost. The apparatus and method are embodied in a combination of software, which provides a so called navigator, and hardware, including a subscriber terminal that provides certain functionality for the navigator and service provider equipment that supports the functionality of the terminal. As such, graphical user interface functionality is distributed between the service provider equipment and subscriber equipment (subscriber terminal). Such distribution provides an enjoyable, real time interactive process for accessing SOD services that allows the subscriber to rapidly identify and access a subscription service.
    Type: Grant
    Filed: May 29, 1998
    Date of Patent: November 6, 2001
    Assignee: DIVA Systems Corporation
    Inventors: Donald F. Gordon, Tobie La Rocca
  • Patent number: 6309713
    Abstract: A layer of tungsten nitride is deposited on the upper surface of a wafer. The deposition is performed by providing a gaseous mixture and providing energy to the gaseous mixture to form a plasma. The gaseous mixture includes a first gaseous composition containing tungsten and a second gaseous composition containing nitrogen and hydrogen. The second gaseous composition is one that does not have a gas phase reaction with the first gaseous composition to form tungsten nitride, unless energy is provided to the gaseous mixture. The first gaseous composition may be tungsten hexafluoride (WF6). The gaseous mixture may be infused with energy to form a plasma by providing it with energy from an rf signal. In the plasma, the nitrogen dissociates into nitrogen ions, and the tungsten separates from the fluorine. The nitrogen ions and tungsten then combine to form tungsten nitride (W2N), which deposits on the wafer's upper surface.
    Type: Grant
    Filed: June 30, 1997
    Date of Patent: October 30, 2001
    Assignee: Applied Materials, Inc.
    Inventors: Alfred Mak, Ling Chen, David C. Smith, Mei Chang, Steve Ghanayem
  • Patent number: 6307818
    Abstract: An integrated coil support and lens holder assembly for a magneto-optical read/write head defined on at least one wafer with a coil supported on a first surface including leads extending to an electrical feedthrough supported in part on the first surface, a lens supporting region supporting a lens in alignment with an open center region of the coil, an electrical feedthrough region defined adjacent the lens and extending through the integrated coil support and lens holder assembly to a second surface, an electrical contact layer extending through to the first surface to contact the electrical cross-over region for the coil, and ABS features incorporated in the integrated coil support and lens holder assembly.
    Type: Grant
    Filed: June 9, 1999
    Date of Patent: October 23, 2001
    Assignee: Seagate Technology LLC
    Inventors: John H. Jerman, Joseph E. Davis
  • Patent number: 6305439
    Abstract: A single step shaft assembly and oil fill process begins with the sleeve and thrust plate being assembled, leaving open the entire shaft cavity. The assembly is then placed in an evacuation chamber, and air is evacuated. A measured amount of oil or hydrofluid is then placed in the shaft cavity. The shaft is then inserted in the shaft cavity and pressed or otherwise inserted into an opening in the thrust plate. When this is done, the oil will disperse throughout the bearing fluid gap and cavity. When properly measured, no oil will exit the cavity.
    Type: Grant
    Filed: February 25, 2000
    Date of Patent: October 23, 2001
    Assignee: Seagate Technology LLC
    Inventors: Kirby V. Pool, David Wuester, Thaveesinn Vasavakul, Kok Chai Low
  • Patent number: 6307728
    Abstract: A method and apparatus that provides a dechucking voltage applied to an electrostatic chuck that facilitates removal of a workpiece or workpiece therefrom. The method incorporates residual chucking force information obtained from the preceding dechuck operation to modify and improve the dechucking algorithm for the subsequent wafer dechucking cycle. To avoid charge accumulation on the electrostatic chuck when processing a succession of workpieces, the chucking and dechucking voltages reverse polarity after each workpiece is dechucked.
    Type: Grant
    Filed: January 21, 2000
    Date of Patent: October 23, 2001
    Assignee: Applied Materials, Inc.
    Inventor: Karl F. Leeser
  • Patent number: 6303879
    Abstract: An apparatus which includes a laminated ceramic body with multilayer electrodes and a method of fabricating this apparatus are disclosed. The laminated ceramic body is formed by layers of ceramic material, with portions of certain layers being silk screened with an intermediate layer of electrically conductive material. Subsequent sintering results in the formation of a solid ceramic body with multilayer electrodes made up of the electrically conductive material layers. The apparatus further comprises an electrical connector extending partially into the ceramic body and intersecting at least one of these electrodes.
    Type: Grant
    Filed: February 17, 1999
    Date of Patent: October 16, 2001
    Assignee: Applied Materials, Inc.
    Inventor: Vincent E. Burkhart
  • Patent number: 6302964
    Abstract: A one-piece gas distribution faceplate for a showerhead. The one-piece gas distribution faceplate includes a first surface, a second surface, and a third surface. The one-piece gas distribution faceplate comprises a plurality of first gas holes extending through the one-piece gas distribution faceplate between the first surface and the second surface. The one-piece gas distribution faceplate has an internal gas distribution cavity defined by a plurality of interconnecting channels. A plurality of second gas holes extend through the one-piece gas distribution faceplate between the first surface into a plurality of the interconnecting channels. The interconnecting channels are fluidly coupled to a plenum that is in turn connected to at least one gas conduit. The gas conduit extends to the third surface.
    Type: Grant
    Filed: March 16, 2000
    Date of Patent: October 16, 2001
    Assignee: Applied Materials, Inc.
    Inventors: Salvador P. Umotoy, Lawrence C. Lei, Anh N. Nguyen, Steve H. Chiao
  • Patent number: 6305019
    Abstract: An interactive information distribution system includes service provider equipment for generating an information stream that is coupled to an information channel and transmitted to subscriber equipment. The service provider also generates a command signal that is coupled to a command channel and transmitted to the subscriber equipment. The service provider also receives information manipulation requests from the subscriber via a back channel. A communication network supporting the information channel, command channel and back channel is coupled between the service provider equipment and the subscriber equipment. The service provider equipment contains two geographically distributed components: central server equipment and a remote video session manager. The central server equipment provides information streams to the remote video session manager in response to information manipulation commands.
    Type: Grant
    Filed: July 16, 1998
    Date of Patent: October 16, 2001
    Assignee: DIVA Systems Corporation
    Inventors: Bradley L. Dyer, Dwight Wesley Fronsdahl, Michael S. Gill, Christopher Goode, John Mark Randall, Steve Zack
  • Patent number: 6298685
    Abstract: The present invention generally provides a system for processing substrates having a carrier disposed primarily in at least one processing chamber and at least one shuttle for transferring substrates between the processing chamber and a load lock chamber. A plurality of processing chambers, load lock chambers, and other chambers can be joined to create a series of modular chambers through which the substrates are processed. Preferably, the carrier is only exposed to the processing environment, i.e., the carrier does not shuttle into a non-processing chamber. Thus, during continuous sequential processing of substrates, thermal cycling of the carrier is reduced. The carrier is reversibly moved within the processing chamber along a track. Multiple processing zones separated by partitions allow a plurality of processing regimes to occur within the same processing chamber.
    Type: Grant
    Filed: November 3, 1999
    Date of Patent: October 9, 2001
    Assignee: Applied Materials, Inc.
    Inventor: Avi Tepman
  • Patent number: 6298071
    Abstract: A method and apparatus for managing both link and disk bandwidth utilization within the context of a multiple subscriber or user information distribution system by selectively providing variable bitrate and constant low bitrate information streams to one or more subscribers.
    Type: Grant
    Filed: September 3, 1998
    Date of Patent: October 2, 2001
    Assignee: Diva Systems Corporation
    Inventors: Clement G. Taylor, Jesse S. Lerman
  • Patent number: 6297147
    Abstract: The present invention provides a method and apparatus for filling contacts, vias, trenches, and other patterns, in a substrate surface, particularly patterns having high aspect ratios. Generally, the present invention provides a method for removing oxygen from the surface of an oxidized metal layer prior to deposition of a subsequent metal. The oxidized metal is treated with a plasma consisting of nitrogen, hydrogen, or a mixture thereof. In one aspect of the invention, the metal layer is Ti, TiN, Ta, TaN, Ni, NiV, or V, and a subsequent wetting layer is deposited using either CVD techniques or electroplating, such as CVD aluminum (Al) or electroplating of copper (Cu). The metal layer can be exposed to oxygen or the atmosphere and then treated with a plasma of nitrogen and/or hydrogen in two or more cycles to remove or reduce oxidation of the surface of the metal layer and nucleate the growth of a subsequent metal layer thereon.
    Type: Grant
    Filed: June 5, 1998
    Date of Patent: October 2, 2001
    Assignee: Applied Materials, Inc.
    Inventors: Lisa Yang, Anish Tolia, Roderick Craig Mosely
  • Patent number: 6296390
    Abstract: A hydrodynamic bearing having a shaft relatively rotatable with rest to a surrounding sleeve and having a thrust plate of or near one end thereof. The shaft and sleeve define a journal bearing extending substantially the full length of the two relatively rotating parts.
    Type: Grant
    Filed: February 24, 1999
    Date of Patent: October 2, 2001
    Assignee: Seagate Technology LLC
    Inventors: Etoli Wolff, Samnathan Murthy, Norbert Steven Parsoneault, Hans Leuthold
  • Patent number: 6296142
    Abstract: A counter balance assembly for a lid assembly comprising a spring inside a housing assembly. The counter balance assembly is mounted to a lid, whose displacement generates an external force substantially along a longitudinal axis of the spring. A restoring force is generated by the spring to counteract an inertia force arising from the lid displacement.
    Type: Grant
    Filed: June 7, 1999
    Date of Patent: October 2, 2001
    Assignee: Applied Materials, Inc.
    Inventor: Son T. Nguyen
  • Patent number: 6292328
    Abstract: A method of creating an improved hydrodynamic fluid bearing is provided which is relatively insensitive to shock vibration changes in load and rotational speed. The hydrodynamic bearing motor in which the bearing is open at both the upper and lower ends, and in which the balance of fluid flow within the bearings is maintained. The assembly of the hydrodynamic bearing is more easily assembled, and the gaps are easily adjusted. In the design of the hydrodynamic bearing, the tolerances for assembly of the various components is minimized; that is, the critical nature of many of the gaps is diminished.
    Type: Grant
    Filed: March 27, 2000
    Date of Patent: September 18, 2001
    Assignee: Seagate Technology LLC
    Inventors: Mohamed Mizanur Rahman, Gunter Karl Heine, Hans Leuthold, Raquib Uddin Khan
  • Patent number: 6291777
    Abstract: A conductive feed-through providing a conductive path through a dielectric body while maintaining differences in pressure between volumes separated by the dielectric body. A conductive feed-through of the present invention employs a hollow conductive tube created by first drilling a bore through the dielectric material. A first electrode is used to cover one end of the bore, and a vacuum-tight seal is formed around this first electrode. A second electrode is attached to the dielectric body at the other end of the bore. The inside surface of the bore is then coated with an electrically conductive material, and the coating provides a conductive path between the first electrode and the second electrode. In an alternative embodiment, the electrically conductive material coating is deposited such that it extends over the surface of the dielectric body so as to function as an electrode as well.
    Type: Grant
    Filed: February 17, 1999
    Date of Patent: September 18, 2001
    Assignee: Applied Materials, Inc.
    Inventors: Vincent E. Burkhart, Michael N. Sugarman