Abstract: A method and apparatus are provided for polishing a substrate surface. In one aspect, an apparatus for polishing a substrate includes a conductive polishing pad and an electrode having a membrane disposed therebetween. The membrane is orientated relative the conductive pad in a manner that facilitates removal of entrained gas from electrolyte flowing towards the conductive pad. The apparatus may be part of an electro-chemical polishing station that may optionally be part of a system that includes chemical mechanical polishing stations.

Abstract: An apparatus for retaining a workpiece and a method of fabricating same. The apparatus contains an electrostatic chuck having a workpiece support surface. The workpiece support surface has protruded regions and non-protruded regions, where a total surface area of the protruded regions is less than a total surface area of the non-protruded regions. The apparatus contains a pedestal having a surface that supports a flex circuit. The topography of the chuck is formed by either machining the surface of the pedestal prior to adhering and conforming the flex circuit to the surface or sculpting the surface of an electrode within the flex circuit.