Abstract: Various methods and apparatus for polishing semiconductor workpieces using electrochemically generated species are disclosed. In one aspect, a method of processing is provided that includes contacting a semiconductor workpiece to a solution, electrochemically generating a chemical species in the solution, and polishing the semiconductor workpiece with the aid of the solution.
Type:
Grant
Filed:
April 30, 2002
Date of Patent:
February 10, 2004
Assignee:
Advanced Micro Devices, Inc.
Inventors:
Christopher H. Lansford, Jeremy S. Lansford