Abstract: Gas-assisted atomizing devices are provided that include liquid orifices, which release liquid, and gas orifices, which release gas to atomize the liquid into droplets. The atomizing devices are formed by at least a first layer and a second layer. The atomizing devices can include a gas supply network and a liquid supply network that supply gas and liquid to the gas and liquid orifices.
Type:
Grant
Filed:
November 13, 2000
Date of Patent:
March 5, 2002
Assignee:
Corning Incorporated
Inventors:
Perry R Skeath, John R Saylor, Amy L Rovelstad