Patents Represented by Attorney Traxler, Bushnell, Gaingiorgi & Blackstone Ltd.
  • Patent number: 6872321
    Abstract: A method of forming a photo-resist image on a substrate, such as a conductive film. The method provides that a photo-resist image is printed directly onto the conductive film, such as by using an ink jet printer. Specifically, a CAD image may be sent from a computer to the ink jet printer, and the ink jet printer may use the CAD image to print the photo-resist image. The method may provide that a copper film is applied to a dielectric substrate, and then the photo-resist image is printed directly onto the copper film. Then, at least a portion of the copper film is removed, such as by etching, and at least a portion of the photo-resist image which has been printed on the copper film is removed, such as by etching. By printing the photo-resist image directly onto the copper film, it is not necessary to perform steps such as: applying a mask, exposing to UV light, and developing.
    Type: Grant
    Filed: September 25, 2002
    Date of Patent: March 29, 2005
    Assignee: LSI Logic Corporation
    Inventors: Manickam Thavarajah, Aritharan Thurairajaratnam, Alejandro Lacap